metal insulator semiconductor
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2022 ◽  
Vol 120 (2) ◽  
pp. 023102
Author(s):  
HoHyun Im ◽  
Geonyeop Lee ◽  
Hyunik Park ◽  
Dongryul Lee ◽  
Jihyun Kim


Author(s):  
N. I. Lysenko ◽  
V. G. Polovinkin

The article presents an example of the implementation of the two-frequency method for measuring the derivative of the capacitance-voltage characteristic. The authors describe the diagram of the measuring system and the software package for the measurement process control. The article also gives the results of measurements of the capacitance-voltage characteristic and its derivative of the silicon-based metal-insulator-semiconductor structure. The qualitative differences between the derivatives of the capacitive characteristics of the metal-insulator-semiconductor structure were obtained as a result of numerical differentiation and its direct measurement by the two-frequency method. The authors offer an explanation for this difference.



2021 ◽  
Vol 130 (24) ◽  
pp. 245701
Author(s):  
Prabhans Tiwari ◽  
Jayeeta Biswas ◽  
Chandan Joishi ◽  
Saurabh Lodha


Author(s):  
Erick Rolando. Martinez Loran ◽  
Guillaume von Gastrow ◽  
Jacob Clenney ◽  
Flavio Fernando Contreras-Torres ◽  
Rico Meier ◽  
...  






2021 ◽  
Vol MA2021-02 (43) ◽  
pp. 1314-1314
Author(s):  
Ponart Aroonratsameruang ◽  
Gabriel Loget ◽  
Pichaya Pattanasattayavong


Author(s):  
Prangya P. Sahoo ◽  
Miroslav Mikolášek ◽  
Kristína Hušeková ◽  
Edmund Dobročka ◽  
Ján Šoltýs ◽  
...  


2021 ◽  
Vol 119 (14) ◽  
pp. 143503
Author(s):  
Trung Huu Nguyen ◽  
Tokio Takahashi ◽  
Hiroshi Chonan ◽  
Hoang Van Nguyen ◽  
Hisashi Yamada ◽  
...  


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