Recent progress and perspectives on atomic‐layer‐deposited semiconducting oxides for transistor applications

2022 ◽  
Author(s):  
Min Hoe Cho ◽  
Cheol Hee Choi ◽  
Jae Kyeong Jeong
Keyword(s):  
Recent Progress ◽  
Atomic Layer ◽  
Semiconducting Oxides

Recent progress of atomic layer deposition on polymeric materials

2017 ◽  
Vol 70 ◽  
pp. 1182-1191 ◽  
Author(s):  
Hong Chen Guo ◽  
Enyi Ye ◽  
Zibiao Li ◽  
Ming-Yong Han ◽  
Xian Jun Loh
Keyword(s):  
Atomic Layer Deposition ◽  
Recent Progress ◽  
Polymeric Materials ◽  
Atomic Layer ◽  
Layer Deposition

Atomic Layer Deposition for Sensitized Solar Cells: Recent Progress and Prospects

2016 ◽  
Vol 3 (21) ◽  
pp. 1600354 ◽  
Author(s):  
Do Han Kim ◽  
Mark D. Losego ◽  
Qing Peng ◽  
Gregory N. Parsons
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Recent Progress ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Sensitized Solar Cells

Atomic layer deposition for nanomaterial synthesis and functionalization in energy technology

2017 ◽  
Vol 4 (2) ◽  
pp. 133-154 ◽  
Author(s):  
Xiangbo Meng ◽  
Xinwei Wang ◽  
Dongsheng Geng ◽  
Cagla Ozgit-Akgun ◽  
Nathanaelle Schneider ◽  
...  
Keyword(s):  
Fuel Cells ◽  
Atomic Layer Deposition ◽  
Recent Progress ◽  
Atomic Layer ◽  
Review Article ◽  
Energy Technology ◽  
Energy Technologies ◽  
Nanomaterial Synthesis ◽  
Layer Deposition

This review article summarizes the recent progress of atomic layer deposition (ALD) in energy technologies including rechargeable secondary batteries, fuel cells, photovoltaics, and optoelectronics.

Recent Progress in Atomic Layer Epitaxy of III–V Compounds

1991 ◽  
Vol 222 ◽  
Author(s):  
S. M. Bedair
Keyword(s):  
Quantum Wells ◽  
Recent Progress ◽  
Atomic Layer ◽  
Reactor Design ◽  
Ternary Alloys ◽  
Carbon Doping ◽  
Atomic Layer Epitaxy ◽  
Ordered Alloys ◽  
Potential Applications

ABSTRACTThe potential applications of Atomic Layer Epitaxy of III–V compounds will be outlined. These include the growth of special structures and devices such as ordered alloys, ultra-thin quantum wells, non-alloyed contacts, planar doped FET's and HBT's. Also, the main challenges facing ALE will be outlined along with possible solutions. These include reactor design, control of carbon doping and the growth of ternary alloys. A general assessment of the ALE technology will be provided.

Recent progress in atomic layer epitaxy of III–V compounds

1988 ◽  
Vol 93 (1-4) ◽  
pp. 182-189 ◽  
Author(s):  
S.M. Bedair ◽  
B.T. McDermott ◽  
Y. Ide ◽  
N.H. Karam ◽  
H. Hashemi ◽  
...  
Keyword(s):  
Recent Progress ◽  
Atomic Layer ◽  
Atomic Layer Epitaxy
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