Epitaxial lateral overgrowth of AlN layers on patterned sapphire substrates

2006 ◽  
Vol 203 (7) ◽  
pp. 1632-1635 ◽  
Author(s):  
K. Nakano ◽  
M. Imura ◽  
G. Narita ◽  
T. Kitano ◽  
Y. Hirose ◽  
...  
2019 ◽  
Vol 507 ◽  
pp. 103-108 ◽  
Author(s):  
Donghyun Lee ◽  
Seungmin Lee ◽  
Giwoong Kim ◽  
Jongmyeong Kim ◽  
Jeonghwan Jang ◽  
...  

1998 ◽  
Vol 537 ◽  
Author(s):  
Zhonghai Yu ◽  
M.A.L. Johnson ◽  
J.D. Brown ◽  
N.A. El-Masry ◽  
J. F. Muth ◽  
...  

AbstractThe epitaxial lateral overgrowth (ELO) process for GaN has been studied using SiC and sapphire substrates. Both MBE and MOVPE growth processes were employed in the study. The use of SiO2 versus SiNx insulator stripes was investigated using window/stripe widths ranging from 2 μm/4 μm to 3 μm/15 μm. GaN film depositions were completed at temperatures ranging from 800°C to 1120°C. Characterization experiments included RHEED, TEM, SEM and cathodolumenescence studies. The MBE growth experiments produced polycrystalline GaN over the insulator stripes even at deposition temperatures as high as 990°C. In contrast, MOVPE growth produced single-crystal GaN stripes with no observable threading dislocations.


2004 ◽  
Vol 241 (12) ◽  
pp. 2763-2766 ◽  
Author(s):  
H. S. Cheong ◽  
M. K. Yoo ◽  
H. G. Kim ◽  
S. J. Bae ◽  
C. S. Kim ◽  
...  

2011 ◽  
Vol 326 (1) ◽  
pp. 200-204 ◽  
Author(s):  
Sang-il Kim ◽  
Bumjoon Kim ◽  
Samseok Jang ◽  
A-young Kim ◽  
Jihun Park ◽  
...  

1999 ◽  
Vol 75 (24) ◽  
pp. 3820-3822 ◽  
Author(s):  
J. A. Smart ◽  
E. M. Chumbes ◽  
A. T. Schremer ◽  
J. R. Shealy

2004 ◽  
Vol 272 (1-4) ◽  
pp. 370-376 ◽  
Author(s):  
Kenji Fujito ◽  
Tadao Hashimoto ◽  
Katsuya Samonji ◽  
James S. Speck ◽  
Shuji Nakamura

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