Epitaxial lateral overgrowth of GaN on sapphire substrates using in-situ carbonized photoresist mask

2011 ◽  
Vol 326 (1) ◽  
pp. 200-204 ◽  
Author(s):  
Sang-il Kim ◽  
Bumjoon Kim ◽  
Samseok Jang ◽  
A-young Kim ◽  
Jihun Park ◽  
...  
2006 ◽  
Vol 203 (7) ◽  
pp. 1632-1635 ◽  
Author(s):  
K. Nakano ◽  
M. Imura ◽  
G. Narita ◽  
T. Kitano ◽  
Y. Hirose ◽  
...  

1998 ◽  
Vol 537 ◽  
Author(s):  
Zhonghai Yu ◽  
M.A.L. Johnson ◽  
J.D. Brown ◽  
N.A. El-Masry ◽  
J. F. Muth ◽  
...  

AbstractThe epitaxial lateral overgrowth (ELO) process for GaN has been studied using SiC and sapphire substrates. Both MBE and MOVPE growth processes were employed in the study. The use of SiO2 versus SiNx insulator stripes was investigated using window/stripe widths ranging from 2 μm/4 μm to 3 μm/15 μm. GaN film depositions were completed at temperatures ranging from 800°C to 1120°C. Characterization experiments included RHEED, TEM, SEM and cathodolumenescence studies. The MBE growth experiments produced polycrystalline GaN over the insulator stripes even at deposition temperatures as high as 990°C. In contrast, MOVPE growth produced single-crystal GaN stripes with no observable threading dislocations.


2012 ◽  
Vol 51 (11R) ◽  
pp. 115501
Author(s):  
Samseok Jang ◽  
Dohan Lee ◽  
Jun-hyuck Kwon ◽  
Sang-il Kim ◽  
So young Yim ◽  
...  

2016 ◽  
Vol 119 (14) ◽  
pp. 145303 ◽  
Author(s):  
Morteza Monavarian ◽  
Natalia Izyumskaya ◽  
Marcus Müller ◽  
Sebastian Metzner ◽  
Peter Veit ◽  
...  

2012 ◽  
Vol 51 ◽  
pp. 115501
Author(s):  
Samseok Jang ◽  
Dohan Lee ◽  
Jun-hyuck Kwon ◽  
Sang-il Kim ◽  
So young Yim ◽  
...  

1999 ◽  
Vol 75 (24) ◽  
pp. 3820-3822 ◽  
Author(s):  
J. A. Smart ◽  
E. M. Chumbes ◽  
A. T. Schremer ◽  
J. R. Shealy

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