Non-reactive metal/oxide interfaces: from model calculations towards realistic simulations

2006 ◽  
Vol 243 (11) ◽  
pp. 2516-2532 ◽  
Author(s):  
Jacek Goniakowski ◽  
Christine Mottet ◽  
Claudine Noguera
ChemInform ◽  
2016 ◽  
Vol 47 (16) ◽  
Author(s):  
A. Picone ◽  
M. Riva ◽  
A. Brambilla ◽  
A. Calloni ◽  
G. Bussetti ◽  
...  

2016 ◽  
Vol 71 (1) ◽  
pp. 32-76 ◽  
Author(s):  
A. Picone ◽  
M. Riva ◽  
A. Brambilla ◽  
A. Calloni ◽  
G. Bussetti ◽  
...  

1985 ◽  
Vol 46 (C4) ◽  
pp. C4-135-C4-140 ◽  
Author(s):  
M. Leseur ◽  
B. Pieraggi

1990 ◽  
Vol 51 (C1) ◽  
pp. C1-781-C1-787
Author(s):  
B. BONVALOT ◽  
G. DHALENNE ◽  
F. MILLOT ◽  
A. REVCOLEVSCHI

1995 ◽  
Vol 02 (01) ◽  
pp. 109-126 ◽  
Author(s):  
ROBERT J. LAD

This article reviews aspects of the electronic, chemical, and structural properties of metal/oxide and oxide/oxide interfaces which are formed via ultrathin film growth on oxide single-crystal surfaces. The interactions at the interfaces are classified based on the nature of the reaction products, thermodynamic predictions of interfacial reactions, and wetting and adhesion. Then, properties of single-crystal oxide substrates and limitations and difficulties in studying these ceramic systems are discussed. The remainder of the article presents experimental observations for several systems involving both metal and oxide ultrathin film growth on stoichiometric NiO (100), TiO 2(110), and [Formula: see text] surfaces including a discussion of interdiffusion, chemical and electronic interactions, thermal stability, and interfacial impurity effects.


2014 ◽  
Vol 4 (1) ◽  
Author(s):  
Samrat Choudhury ◽  
Dane Morgan ◽  
Blas Pedro Uberuaga

Sign in / Sign up

Export Citation Format

Share Document