Fabrication of thick AlN film by low pressure hydride vapor phase epitaxy
2006 ◽
Vol 3
(6)
◽
pp. 1479-1482
◽
Keyword(s):
2010 ◽
Vol 312
(4)
◽
pp. 490-494
◽
Keyword(s):
2013 ◽
Vol 52
(8S)
◽
pp. 08JB31
◽
Keyword(s):
2004 ◽
Vol 457-460
◽
pp. 1581-1584
Electrical Characterization of Ruthenium-Doped InP Grown by Low Pressure Hydride Vapor Phase Epitaxy
2001 ◽
Vol 4
(6)
◽
pp. G53
◽
Keyword(s):
2007 ◽
Vol 46
(No. 23)
◽
pp. L552-L555
◽
Keyword(s):
2014 ◽
Vol 53
(5S1)
◽
pp. 05FL03
◽
Keyword(s):
2020 ◽
Vol 540
◽
pp. 125623
◽