Oxide Films Formed on MoSi2 Anode in Molten MgCl2–NaCl–CaCl2 and Molten LiCl–KCl

2021 ◽  
pp. 19-25
Author(s):  
Takamasa Miyoshi ◽  
Taiki Morishige ◽  
Toshihide Takenaka
Keyword(s):  
Oxide Films

Resolving Crystallites in Zirconium Oxide Films

1969 ◽  
Vol 27 ◽  
pp. 140-141
Author(s):  
R.A. Ploc
Keyword(s):  
Electron Microscope ◽  
Inelastic Scattering ◽  
Zirconium Oxide ◽  
Oxide Films ◽  
Optic Axis ◽  
Objective Lens ◽  
Microscope Objective ◽  
Linear Optic ◽  
A Current ◽  
Microscope Objective Lens

The optic axis of an electron microscope objective lens is usually assumed to be straight and co-linear with the mechanical center. No reason exists to assume such perfection and, indeed, simple reasoning suggests that it is a complicated curve. A current centered objective lens with a non-linear optic axis when used in conjunction with other lenses, leads to serious image errors if the nature of the specimen is such as to produce intense inelastic scattering.

Analysis of Sputtered Zinc Oxide Films

1980 ◽  
Vol 38 ◽  
pp. 416-417
Author(s):  
T. A. Emma ◽  
M. P. Singh
Keyword(s):  
Electron Microscopy ◽  
Zinc Oxide ◽  
Piezoelectric Materials ◽  
Oxide Films ◽  
Optical Quality ◽  
Zno Films ◽  
Rf Power ◽  
X Ray Diffraction ◽  
Sputtered Films ◽  
Zinc Oxide Films

Optical quality zinc oxide films have been characterized using reflection electron diffraction (RED), replication electron microscopy (REM), scanning electron microscopy (SEM), and X-ray diffraction (XRD). Significant microstructural differences were observed between rf sputtered films and planar magnetron rf sputtered films. Piezoelectric materials have been attractive for applications to integrated optics since they provide an active medium for signal processing. Among the desirable physical characteristics of sputtered ZnO films used for this and related applications are a highly preferred crystallographic texture and relatively smooth surfaces. It has been found that these characteristics are very sensitive to the type and condition of the substrate and to the several sputtering parameters: target, rf power, gas composition and substrate temperature.

EFFECT OF DEPOSITION TEMPERATURE ON PLASMA GROWN ALUMINUM OXIDE FILMS

1988 ◽  
Vol 49 (C4) ◽  
pp. C4-409-C4-412 ◽  
Author(s):  
C. BOURREAU ◽  
Y. CATHERINE
Keyword(s):  
Aluminum Oxide ◽  
Deposition Temperature ◽  
Oxide Films

Characterization of oxide films for corrosion control

2003 ◽  
Vol 91 ◽  
pp. 126-128
Author(s):  
Yoshinori Yomura
Keyword(s):  
Oxide Films ◽  
Corrosion Control

Properties of Transparent Conductive Zinc Oxide Films Deposited on COP Substrates by PLD Method

2009 ◽  
Vol 129 (11) ◽  
pp. 1981-1984
Author(s):  
Yuki Ueno ◽  
Takanori Aoki ◽  
Akio Suzuki ◽  
Tatsuhiko Matsushita ◽  
Masahiro Okuda
Keyword(s):  
Zinc Oxide ◽  
Oxide Films ◽  
Zinc Oxide Films

Infrared spectra of oxide films on SUS430 stainless steel formed at temperatures between 473 and 1073 K

1992 ◽  
Vol 7 (1) ◽  
pp. 80-84 ◽  
Author(s):  
Katsuya Honda ◽  
Tooru Atake ◽  
Yasutoshi Saito
Keyword(s):  
Stainless Steel ◽  
Infrared Spectra ◽  
Oxide Films

Inclined Substrate Deposition of Biaxially Textured Magnesium Oxide Films

2008 ◽  
Author(s):  
Beihai Ma ◽  
U. (Balu). Balachandran ◽  
Rachel E. Koritala ◽  
Dean J. Miller
Keyword(s):  
Magnesium Oxide ◽  
Oxide Films
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