Diffusion in Cobalt Silicide During Silicide Formation

Crucial Issues in Semiconductor Materials and Processing Technologies ◽

10.1007/978-94-011-2714-1_36 ◽

1992 ◽

pp. 369-374 ◽

Cited By ~ 2

Author(s):

C. M. Comrie ◽

J. E. McLeod

Keyword(s):

Cobalt Silicide ◽

Silicide Formation

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Cobalt silicide formation by ion mixing

Thin Solid Films ◽

10.1016/0040-6090(84)90259-1 ◽

1984 ◽

Vol 119 (4) ◽

pp. 357-364 ◽

Cited By ~ 51

Author(s):

A.H. Hamdi ◽

M.-A. Nicolet

Keyword(s):

Cobalt Silicide ◽

Silicide Formation

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Insituresistivity measurement of cobalt silicide formation

Journal of Applied Physics ◽

10.1063/1.339486 ◽

1987 ◽

Vol 62 (6) ◽

pp. 2290-2294 ◽

Cited By ~ 24

Author(s):

G. Ottaviani ◽

K. N. Tu ◽

P. Psaras ◽

C. Nobili

Keyword(s):

Cobalt Silicide ◽

Silicide Formation

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Nickel and cobalt silicide formation by broad and focused ion beam implantation

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/0168-583x(89)90790-8 ◽

1989 ◽

Vol 39 (1-4) ◽

pp. 291-296 ◽

Cited By ~ 10

Author(s):

T. Aoki ◽

K. Gamo ◽

S. Namba ◽

T. Shiokawa ◽

K. Toyoda ◽

...

Keyword(s):

Focused Ion Beam ◽

Ion Beam ◽

Cobalt Silicide ◽

Silicide Formation ◽

Ion Beam Implantation

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Effect of a Ti diffusion barrier on the cobalt silicide formation: solid solution, segregation and reactive diffusion

Acta Materialia ◽

10.1016/j.actamat.2020.116504 ◽

2021 ◽

Vol 204 ◽

pp. 116504

Author(s):

Hannes Zschiesche ◽

Claude Alfonso ◽

Ahmed Charaï ◽

Dominique Mangelinck

Keyword(s):

Solid Solution ◽

Diffusion Barrier ◽

Reactive Diffusion ◽

Cobalt Silicide ◽

Silicide Formation

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Cobalt silicide formation caused by arsenic ion beam mixing and rapid thermal annealing

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/0168-583x(91)96277-r ◽

1991 ◽

Vol 55 (1-4) ◽

pp. 773-777 ◽

Cited By ~ 2

Author(s):

Min Ye ◽

Edmund Burte ◽

Pei-Hsin Tsien ◽

Heiner Ryssel

Keyword(s):

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Ion Beam ◽

Cobalt Silicide ◽

Silicide Formation ◽

Ion Beam Mixing

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On the influence of the surface pretreatment of a Si substrate on cobalt silicide formation

Semiconductor Science and Technology ◽

10.1088/0268-1242/5/7/019 ◽

1990 ◽

Vol 5 (7) ◽

pp. 745-751 ◽

Cited By ~ 4

Author(s):

A L De Laere ◽

R L Van Meirhaeghe ◽

W H Laflere ◽

F Cardon

Keyword(s):

Cobalt Silicide ◽

Silicide Formation ◽

Si Substrate ◽

Surface Pretreatment

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Effect of ion-beam mixing temperature on cobalt silicide formation

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/0168-583x(93)90682-v ◽

1993 ◽

Vol 80-81 ◽

pp. 786-789 ◽

Cited By ~ 11

Author(s):

I. Kasko ◽

C. Dehm ◽

L. Frey ◽

H. Ryssel

Keyword(s):

Ion Beam ◽

Cobalt Silicide ◽

Silicide Formation ◽

Ion Beam Mixing

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Swift heavy ion induced modification of the Co/Si interface; cobalt silicide formation

Surface and Coatings Technology ◽

10.1016/s0257-8972(02)00216-5 ◽

2002 ◽

Vol 158-159 ◽

pp. 59-63 ◽

Cited By ~ 24

Author(s):

D Bhattacharya ◽

S.K Srivastava ◽

P.K Sahoo ◽

G Principi ◽

D Kabiraj ◽

...

Keyword(s):

Heavy Ion ◽

Cobalt Silicide ◽

Silicide Formation ◽

Swift Heavy Ion

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Effect of Deposition Temperature and Sputtering Ambient on In Situ Cobalt Silicide Formation

Journal of The Electrochemical Society ◽

10.1149/1.1837978 ◽

1997 ◽

Vol 144 (9) ◽

pp. 3175-3179 ◽

Cited By ~ 5

Author(s):

Jeong Soo Byun ◽

Ji‐Soo Park ◽

Jae Jeong Kim

Keyword(s):

Deposition Temperature ◽

Cobalt Silicide ◽

Silicide Formation

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The influence of oxygen on cobalt silicide formation

Thin Solid Films ◽

10.1016/0040-6090(90)90461-l ◽

1990 ◽

Vol 189 (2) ◽

pp. 321-327 ◽

Cited By ~ 3

Author(s):

H.C. Swart ◽

G.L.P. Berning ◽

J. Du Plessis

Keyword(s):

Cobalt Silicide ◽

Silicide Formation

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