Metastable Fragmentation of Rare Gas Cluster Ions Initiated by Excimer Decay

1992 ◽  
pp. 1089-1094 ◽  
Author(s):  
M. Foltin ◽  
G. Walder ◽  
T. D. Märk
Keyword(s):  
Cluster Ions ◽  
Rare Gas ◽  
Metastable Fragmentation

Production and Characterization of Deposited Mono-Sized Clusters

1990 ◽  
Vol 206 ◽  
Author(s):  
Donald M. Cox ◽  
Barbara Kessler ◽  
Pierre Fayet ◽  
Wolfgang Eberhardt ◽  
Rex D. Sherwood ◽  
...  
Keyword(s):  
Cluster Size ◽  
Surface Coverage ◽  
Metal Clusters ◽  
High Energy ◽  
Cluster Ions ◽  
Rare Gas ◽  
Ion Sputtering ◽  
Transition Metal Clusters ◽  
X Ray

ABSTRACTUsing high energy rare gas ion sputtering of metal targets, we are able to produce nanoamps of mass selected transition metal clusters. Mono-sized cluster ions are deposited at low kinetic energy upon substrates, e.g. silica or carbon, and are then characterized using UV and x-ray photoemission. In this paper we will discuss photoemission measurements of the 4f7/2 core level energies of Au (1–5,7 atom samples) clusters deposited on silica. From such studies we are beginning to understand how electronic structure, cluster stability and mobility depend on (deposited) cluster size, surface coverage, and substrate temperature.

Stability of rare gas cluster ions

1990 ◽  
Vol 92 (7) ◽  
pp. 4408-4416 ◽  
Author(s):  
Kenzo Hiraoka ◽  
Toshiharu Mori
Keyword(s):  
Cluster Ions ◽  
Rare Gas

“Softlanding” of Monodispersed Small Metal Clusters in Rare Gas Matrices.

1990 ◽  
Vol 206 ◽  
Author(s):  
W. Harbich ◽  
S. Fedrigo ◽  
J. Buttet ◽  
D.M. Lindsay
Keyword(s):  
Metal Clusters ◽  
Quadrupole Mass Filter ◽  
Cluster Ions ◽  
Rare Gas ◽  
Spectroscopic Methods ◽  
Metal Target ◽  
Quadrupole Mass ◽  
Mass Filter ◽  
Target Energy

ABSTRACTWe report on the successful softlanding of size selected metal clusters in rare gas matrices. Cluster-ions are sputtered from a metal target, energy filtered and mass selected by a quadrupole mass filter. Deposited clusters are detected by optical spectroscopic methods ( absorption, excitation, fluorescence). Our results show that for dimers and trimers fragmentation decreases with decreasing landing energy. In the case of Ag2 for example fewer than 25% of the dimers fragment when they are deposited at 20 eV. Triatomic clusters appear to fragment less easily than the dimers. New spectroscopic transitions have been found for both diatomic and triatomic clusters. Our results, when compared with previous studies on conventionally prepared clusters, show that some dimer and trimer features are incorrectly assigned.

REACTION PROCESSES INVOLVING GAS-PHASE CLUSTERS

1996 ◽  
Vol 03 (01) ◽  
pp. 631-635 ◽  
Author(s):  
TAMOTSU KONDOW
Keyword(s):  
Gas Phase ◽  
Cluster Ions ◽  
Rare Gas ◽  
Cluster Anions ◽  
Gas Phase Clusters ◽  
Dynamic Solvent Effect ◽  
Rare Gas Atoms ◽  
Surface Collision ◽  
Collective Vibrations ◽  
Reaction Processes

Gas-phase clusters exhibit specific reactivities which mainly arise from their unique geometric and electronic structures, and collective vibrations due to a limited number of the constituent atoms and molecules. In order to elucidate the specificities of the reaction processes involving the clusters, we describe several examples including our studies on collisional dissociation of size-selected sodium-cluster ions with rare-gas atoms, and impact of size-selected aluminum-cluster anions and [Formula: see text] with a silicon surface. In particular, the essential features of the cluster-anion-surface collision are elucidated. A dynamic solvent effect on the dissociation of [Formula: see text] is observed in the [Formula: see text] system.

MOLECULAR-DYNAMICS SIMULATION OF SURFACE SPUTTERING BY ENERGETIC RARE-GAS CLUSTER IMPACT

1996 ◽  
Vol 03 (01) ◽  
pp. 1023-1027 ◽  
Author(s):  
Z. INSEPOV ◽  
I. YAMADA
Keyword(s):  
Molecular Dynamics ◽  
Molecular Dynamics Simulation ◽  
Cluster Size ◽  
Silicon Surfaces ◽  
Dynamics Simulation ◽  
Cluster Ions ◽  
Rare Gas ◽  
Cluster Energy ◽  
Small Clusters ◽  
Surface Sputtering

The molecular-dynamics simulation is used for simulation of sputtering of gold and silicon surfaces by accelerated [Formula: see text] cluster ions with n~55–200 and energies of 10–100 eV per cluster atom. The sputtering yield Y can be described by a power dependency Y ∝E2.35 on the total cluster energy. The result of the calculation agrees with the experimental data point at the energy of 29 keV and cluster size of 300 Ar atoms. The simulation shows that the sputtered flux has a significant lateral-momentum component and the sputtered surface materials contain not only atoms but also small clusters.

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