Optimisation of discharge parameters for the analysis of high purity silicon wafers by magnetic sector glow discharge mass spectrometry

1992 ◽  
Vol 343 (9-10) ◽  
pp. 773-777 ◽  
Author(s):  
Dafydd M. P. Milton ◽  
Robert C. Hutton ◽  
Gerry A. Ronan
Keyword(s):  
Mass Spectrometry ◽  
Glow Discharge ◽  
High Purity ◽  
Silicon Wafers ◽  
Glow Discharge Mass Spectrometry ◽  
Magnetic Sector ◽  
High Purity Silicon ◽  
Discharge Parameters

Quantification of discharge gas to optimize discharge parameters for relative sensitivity factors (RSFs) determination by slow-flow glow discharge mass spectrometry (GDMS)

2020 ◽  
Vol 35 (11) ◽  
pp. 2748-2757
Author(s):  
Gagan Paudel ◽  
Marisa Di Sabatino
Keyword(s):  
Mass Spectrometry ◽  
Glow Discharge ◽  
Relative Sensitivity ◽  
Glow Discharge Mass Spectrometry ◽  
Slow Flow ◽  
Discharge Condition ◽  
Discharge Parameters ◽  
Sensitivity Factors ◽  
Discharge Gas

It is likely that plotting of variation in quantification of discharge gas can be used to optimize and select discharge condition that can eventually help for RSFs determination.

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