Three dimensional modelling of inductively coupled plasma torches: comparison with experiments and applications

2004 ◽  
Vol 54 (S3) ◽  
pp. C489-C515 ◽  
Author(s):  
V. Colombo ◽  
D. Bernardi ◽  
E. Ghedini ◽  
A. Mentrelli ◽  
T. Trombetti
Keyword(s):  
Inductively Coupled Plasma ◽  
Three Dimensional ◽  
Inductively Coupled ◽  
Plasma Torches ◽  
Comparison With Experiments

Three-dimensional modeling of inductively coupled plasma torches

2005 ◽  
Vol 77 (2) ◽  
pp. 359-372 ◽  
Author(s):  
D. Bernardi ◽  
V. Colombo ◽  
E. Ghedini ◽  
A. Mentrelli
Keyword(s):  
Inductively Coupled Plasma ◽  
Three Dimensional ◽  
Plasma Temperature ◽  
Operating Conditions ◽  
Field Equations ◽  
Inductively Coupled ◽  
Plasma Torches ◽  
Three Dimensional Modeling ◽  
Argon Plasmas ◽  
Energy Equations

A 3D model for the simulation of inductively coupled plasma torches (ICPTs) working at atmospheric pressure is presented, using a customized version of the computational fluid dynamics (CFD) commercial code FLUENT®. The induction coil is taken into account in its actual 3D shape, showing the effects on the plasma discharge of removing the axisymmetric hypothesis of simplification, which characterizes 2D approaches. Steady flow and energy equations are solved for optically thin argon plasmas under the assumptions of local thermodynamic equilibrium (LTE) and laminar flow. The electromagnetic field equations are solved on an extended grid in the vector potential form. In order to evaluate the importance of various 3D effects on calculated plasma temperature and velocity fields, comparisons of our new results with the ones obtainable from 2D models and from an improved 2D model that includes 3D coil effects are presented. 3D results are shown for torches working under various geometric and operating conditions and with different coil shapes, including conventional helicoidal, as well as planar, elliptical, and double-stage configurations.

Three-dimensional modeling and schlieren visualization of pure Ar plasma flow in inductively coupled plasma torches

2015 ◽  
Vol 30 (2) ◽  
pp. 360-367 ◽  
Author(s):  
Konstantin Yu. Nagulin ◽  
Damir Sh. Akhmetshin ◽  
Albert Kh. Gilmutdinov ◽  
Rinat A. Ibragimov
Keyword(s):  
Plasma Flow ◽  
Inductively Coupled Plasma ◽  
Three Dimensional ◽  
Stationary Model ◽  
Inductively Coupled ◽  
Plasma Torches ◽  
Three Dimensional Modeling ◽  
Dimensional Modeling ◽  
Schlieren Visualization ◽  
Ar Plasma

A three-dimensional, non-stationary model has been developed for simulating the behavior of pure Ar inductively coupled plasma (ICP) torches.

Three-dimensional modelling of inductively coupled plasma torches

2003 ◽  
Vol 22 (1) ◽  
pp. 119-125 ◽  
Author(s):  
D. Bernardi ◽  
V. Colombo ◽  
E. Ghedini ◽  
A. Mentrelli
Keyword(s):  
Inductively Coupled Plasma ◽  
Three Dimensional ◽  
Inductively Coupled ◽  
Plasma Torches

A REVERSIBLE OPTICAL SENSOR BASED ON CHITOSAN FILM FOR THE SELECTIVE DETECTION OF COPPER IONS

2012 ◽  
Vol 24 (05) ◽  
pp. 453-459 ◽  
Author(s):  
Shenhsiung Lin ◽  
Chia-Chen Chang ◽  
Chii-Wann Lin
Keyword(s):  
Functional Groups ◽  
Inductively Coupled Plasma ◽  
Copper Ions ◽  
Three Dimensional ◽  
Copper Ion ◽  
Chitosan Film ◽  
Detection Limits ◽  
Dimensional Structure ◽  
Optical Detectors ◽  
Inductively Coupled

Heavy metals greatly influence animal physiology, even at small doses. Among these metals, the copper ion is of great concern due to its effects on humans and wide applications in industry. Compared to atomic absorption spectroscopy and inductively coupled plasma-mass spectrometry, which destroy the samples that are analyzed, optical techniques do not decompose the analyte and have become a popular field of recent research. In this paper, we combined a novel optical detector that did not require sample-labeling, called surface plasmon resonance (SPR), with chitosan to detect copper ions by modifying the functional groups of chitosan through pH modification. Compared to other optical detectors, the SPR system was relatively fast and involved fewer experimental confounding factors. The three-dimensional structure of chitosan was used to obtain lower detection limits. Moreover, modification of the chitosan functional groups resulted in efficient regeneration by controlling the pH. A detection limit of 0.1 μM was obtained (linear range: 0.5–10 μM, R2 = 0.976), and the specificity was certified by comparing the copper ion with six other ions. Additionally, we successfully regenerated the SPR chips by modifying the functional groups. In conclusion, the chitosan–SPR system detected copper ions with improved detection limits using a quick and simple regeneration method.

Theoretical Prediction of the Effect of Coil Configuration on Gas Mixing in an Inductively Coupled Plasma Torch

1987 ◽  
Vol 98 ◽  
Author(s):  
John W. Mckelliget ◽  
Nagy El-Kaddah
Keyword(s):  
Reaction Kinetics ◽  
Inductively Coupled Plasma ◽  
Plasma Torch ◽  
Coil Design ◽  
Potential Equation ◽  
Analysis And Design ◽  
Inductively Coupled ◽  
Plasma Torches ◽  
Coil Geometry ◽  
Electromagnetic Vector Potential

ABSTRACTA mathematical model for the analysis and design of inductively coupled plasma torches Is presented. The model is based upon a solution of the electromagnetic vector potential equation and is capable of predicting the two-dimensional velocity, temperature, and electromagnetic fields as well as the reaction kinetics inside the torch for any axi-symmetric coil configuration. The model is used to study the effect of coil geometry on the thermal decomposition of silicon tetrachloride to silicon. The coil geometry Is found to affect both the temperature field and the flow field and to have a significant effect on the reaction kinetics in the torch. It is demonstrated that through fundamental changes in the coil design It is possible to control the location of the reaction zone and to prevent silicon deposition on the wall of the reactor.

Three-Dimensional Discharge Simulation of Inductively Coupled Plasma Etcher

2007 ◽  
Author(s):  
Jia Cheng ◽  
Yu Zhu ◽  
Guanghong Duan ◽  
Yangying Chen
Keyword(s):  
Electron Temperature ◽  
Inductively Coupled Plasma ◽  
Three Dimensional ◽  
Argon Plasma ◽  
Plasma Parameters ◽  
Inductively Coupled ◽  
Parameters Selection ◽  
Dimensional Distribution ◽  
Discharge Model ◽  
Discharge Simulation

Based on the commercial software, CFD-ACE+, a three-dimensional discharge model of an inductively coupled plasma (ICP) etcher was built. The spatial distributions of the electron temperature and the electron number density (END) of the argon plasma were simulated at 10 mTorr, 200 W and 200 sccm. One-dimensional distribution profiles of the plasma parameters above the wafer’s surface at different pressures and powers were compared. These results demonstrate that the END increases with both pressure and power. And the electron temperature decreases with pressure. The methods and conclusions can be used to provide some reference for the configurations of the chamber and the coil of the ICP equipment design and improvement and process parameters selection.

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