Structure and electrical properties of HfO2 high-k films prepared by pulsed laser deposition on Si (100)

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Y. Wang ◽  
J. Feng ◽  
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Author(s):  
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Y. Cui ◽  
Z.G. Hu ◽  
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Vol 46 (23) ◽  
pp. 5709 ◽  
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Frédéric Terracher


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