scholarly journals Comment on: “Characterization of Microroughness Parameters in Titanium Nitride Thin Films Grown by DC Magnetron Sputtering” [J Fusion Energ DOI 10.1007/s10894-012-9510-z]

2012 ◽  
Vol 31 (6) ◽  
pp. 591-591 ◽  
Author(s):  
Shahram Solaymani ◽  
Atefeh Ghaderi ◽  
Negin Beryani Nezafat
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Dc Magnetron Sputtering

Characterization of Microroughness Parameters in Titanium Nitride Thin Films Grown by DC Magnetron Sputtering

2012 ◽  
Vol 31 (6) ◽  
pp. 586-590 ◽  
Author(s):  
Ali Gelali ◽  
Azin Ahmadpourian ◽  
Reza Bavadi ◽  
M. R. Hantehzadeh ◽  
Arman Ahmadpourian
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Dc Magnetron Sputtering

Characterization of Ti–Zr–V thin films deposited by DC and unipolar pulsed DC magnetron sputtering

Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110200
Author(s):  
Sihui Wang ◽  
Wei Wei ◽  
Yonghao Gao ◽  
Haibin Pan ◽  
Yong Wang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

Growth and Characterization of Epitaxial Wurtzite Al1-xInxN Thin Films Deposited by UHV Reactive Dual DC Magnetron Sputtering

2003 ◽  
Vol 433-436 ◽  
pp. 987-990 ◽  
Author(s):  
T. Seppänen ◽  
György Z. Radnóczi ◽  
Sukkaneste Tungasmita ◽  
L. Hultman ◽  
J. Birch
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering

Characterization of YBa2Cu3O7−δ thin films deposited by dc magnetron sputtering

1996 ◽  
Vol 31 (23) ◽  
pp. 6137-6144 ◽  
Author(s):  
Yupu Li ◽  
J. A. Kilner ◽  
J. Thomas ◽  
D. Lacey ◽  
L. F. Cohen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering

Deposition and Characterization of Tungsten Carbide Thin Films by DC Magnetron Sputtering for Wear-Resistant Applications

JOM ◽  
2013 ◽  
Vol 65 (4) ◽  
pp. 562-566 ◽  
Author(s):  
Tolga Tavsanoglu ◽  
Ceren Begum ◽  
Murat Alkan ◽  
Onuralp Yucel
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tungsten Carbide ◽  
Dc Magnetron Sputtering ◽  
Wear Resistant

Deposition and characterization of ternary thin films within the Ti–Al–C system by DC magnetron sputtering

2006 ◽  
Vol 291 (1) ◽  
pp. 290-300 ◽  
Author(s):  
O. Wilhelmsson ◽  
J.-P. Palmquist ◽  
E. Lewin ◽  
J. Emmerlich ◽  
P. Eklund ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering
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