Deposition and Characterization of Tungsten Carbide Thin Films by DC Magnetron Sputtering for Wear-Resistant Applications

JOM ◽  
2013 ◽  
Vol 65 (4) ◽  
pp. 562-566 ◽  
Author(s):  
Tolga Tavsanoglu ◽  
Ceren Begum ◽  
Murat Alkan ◽  
Onuralp Yucel
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tungsten Carbide ◽  
Dc Magnetron Sputtering ◽  
Wear Resistant

Characterization of Ti–Zr–V thin films deposited by DC and unipolar pulsed DC magnetron sputtering

Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110200
Author(s):  
Sihui Wang ◽  
Wei Wei ◽  
Yonghao Gao ◽  
Haibin Pan ◽  
Yong Wang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

Growth and Characterization of Epitaxial Wurtzite Al1-xInxN Thin Films Deposited by UHV Reactive Dual DC Magnetron Sputtering

2003 ◽  
Vol 433-436 ◽  
pp. 987-990 ◽  
Author(s):  
T. Seppänen ◽  
György Z. Radnóczi ◽  
Sukkaneste Tungasmita ◽  
L. Hultman ◽  
J. Birch
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering

Characterization of YBa2Cu3O7−δ thin films deposited by dc magnetron sputtering

1996 ◽  
Vol 31 (23) ◽  
pp. 6137-6144 ◽  
Author(s):  
Yupu Li ◽  
J. A. Kilner ◽  
J. Thomas ◽  
D. Lacey ◽  
L. F. Cohen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering

Deposition and characterization of ternary thin films within the Ti–Al–C system by DC magnetron sputtering

2006 ◽  
Vol 291 (1) ◽  
pp. 290-300 ◽  
Author(s):  
O. Wilhelmsson ◽  
J.-P. Palmquist ◽  
E. Lewin ◽  
J. Emmerlich ◽  
P. Eklund ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering

Characterization of Tantalum Nitride Thin Films Deposited on SiO[sub 2]∕Si Substrates Using dc Magnetron Sputtering for Thin Film Resistors

2006 ◽  
Vol 153 (2) ◽  
pp. G164 ◽  
Author(s):  
Nguyen Duy Cuong ◽  
Dong-Jin Kim ◽  
Byoung-Don Kang ◽  
Chang Soo Kim ◽  
Kwang-Min Yu ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Tantalum Nitride ◽  
Dc Magnetron Sputtering ◽  
Si Substrates ◽  
Thin Film Resistors

ELECTRICAL CHARACTERIZATION OF EPITAXIAL BI:2201

2002 ◽  
Vol 16 (04) ◽  
pp. 127-133 ◽  
Author(s):  
A. V. POP ◽  
G. ILONCA ◽  
MARIANA POP ◽  
R. DELTOUR
Keyword(s):  
Thin Films ◽  
Electrical Resistivity ◽  
Magnetron Sputtering ◽  
Normal State ◽  
Electrical Resistance ◽  
Electrical Characterization ◽  
Dc Magnetron Sputtering ◽  
Normal State Resistivity ◽  
Partial Pressures

Bi2.1Sr1.9CuOy thin films (Bi:2201) were deposited onto heated single crystal (100) MgO substrates using inverted cylindrical DC magnetron sputtering with different partial pressures of oxygen in a sputtering gas. The behavior of the normal state resistivity function of temperature is strongly influenced by the composition of sputtering gas used in thin films synthesis. Near the transition to the superconducting state, electrical resistivity changes strongly from "metallic" to insulator (MI). The origin for the increase of electrical resistance was analyzed using some models for the localization of mobile carriers. A good linearity is obtained for ln R as a function of Tα for α = 1/10 and for R as a function of ln T. The last behavior agrees with the pinning and fragmentation of 1D stripes in CuO2 planes.

Synthesis and characterization of MoB2−x thin films grown by nonreactive DC magnetron sputtering

2016 ◽  
Vol 34 (3) ◽  
pp. 031511 ◽  
Author(s):  
Paulius Malinovskis ◽  
Justinas Palisaitis ◽  
Per O. Å. Persson ◽  
Erik Lewin ◽  
Ulf Jansson
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Synthesis And Characterization ◽  
Dc Magnetron Sputtering
Sign in / Sign up

Export Citation Format

Share Document