Generation of Plasma with Increased Ionization Degree in a Pulsed High-Current Low-Pressure Hollow Cathode Discharge

2021 ◽  
Vol 63 (10) ◽  
pp. 1757-1765
Author(s):  
V. V. Yakovlev ◽  
V. V. Denisov ◽  
N. N. Koval ◽  
S. S. Kovalsky ◽  
E. V. Ostroverkhov ◽  
...  
Keyword(s):  
Hollow Cathode ◽  
Low Pressure ◽  
Hollow Cathode Discharge ◽  
High Current ◽  
Ionization Degree

High-Current Stages in a Low-Pressure Glow Discharge With Hollow Cathode

2013 ◽  
Vol 41 (8) ◽  
pp. 2087-2096 ◽  
Author(s):  
Yury D. Korolev ◽  
Oleg B. Frants ◽  
Nikolay V. Landl ◽  
Ilja A. Shemyakin ◽  
Vladimir G. Geyman
Keyword(s):  
Glow Discharge ◽  
Hollow Cathode ◽  
Low Pressure ◽  
High Current ◽  
Pressure Glow Discharge

RF Plasma CVD Using Hollow Cathode Discharge

1988 ◽  
Vol 129 ◽  
Author(s):  
Shin Araki ◽  
Hideki Kamaji ◽  
Kazuo Norimoto
Keyword(s):  
Hollow Cathode ◽  
Low Pressure ◽  
High Density ◽  
Hollow Cathode Discharge ◽  
Rf Plasma ◽  
High Deposition Rate ◽  
Plasma Cvd ◽  
Plasma Damage ◽  
Discharge Electrode ◽  
Density Plasma

ABSTRACTWe have made a-Si photoreceptors at low pressure to prevent the formation of SimHn powders and by separating the growing surface from the high density plasma. A new plasma CVD method using a hollow-cathode discharge, where the discharge electrode is the cathode, is described. There is a hollow region in the discharge electrode. Hollow-cathode discharge enables a high density plasma to form at low pressure. The gas is decomposed in the hollow cathode preventing plasma damage to the film. This method allows us to achieve a high deposition rate (10 µm/h) and good quality films for photoreceptors.

scholarly journals Studies of the cathode sheath of a low pressure hollow cathode discharge

2012 ◽  
Vol 370 ◽  
pp. 012041 ◽  
Author(s):  
G Petraconi ◽  
A B Guimarães Neto ◽  
H S Maciel ◽  
R S Pessoa
Keyword(s):  
Hollow Cathode ◽  
Low Pressure ◽  
Hollow Cathode Discharge ◽  
Cathode Sheath

Low-pressure, high-current hollow cathode with a ferroelectric plasma source

2002 ◽  
Vol 81 (23) ◽  
pp. 4341-4343 ◽  
Author(s):  
A. Krokhmal ◽  
J. Z. Gleizer ◽  
Ya. E. Krasik ◽  
J. Felsteiner
Keyword(s):  
Hollow Cathode ◽  
Plasma Source ◽  
Low Pressure ◽  
High Current
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