Silicon Production via Reaction of Silicon Tetrachloride and Aluminum Subchloride

2019 ◽  
Vol 50 (5) ◽  
pp. 2197-2204
Author(s):  
Roman A. Zakirov ◽  
Oleg G. Parfenov
Author(s):  
Richard S. Thomas ◽  
Prabir K. Basu ◽  
Francis T. Jones

Silicon tetrachloride, used in industry for the production of highest purity silicon and silica, is customarily manufactured from silica-sand and charcoal.SiCl4 can also be made from rice hulls, which contain up to 20 percent silica and only traces of other mineral matter. Hulls, after carbonization, actually prove superior as a starting material since they react at lower temperature. This use of rice hulls may offer a new, profitable solution for a rice mill byproduct disposal problem.In studies of the reaction kinetics with carbonized hulls, conversion of SiO2 to SiCl4 was found to proceed within a few minutes to a constant, limited yield which depended reproducibly on the ambient temperature of the reactor. See Fig. 1. This suggested that physical or chemical heterogeneity of the silica in the hull structure might be involved.


2000 ◽  
Vol 43 (1-4) ◽  
pp. 243-256 ◽  
Author(s):  
Therese Videm Buø ◽  
Ralph J Gray ◽  
Raymond M Patalsky
Keyword(s):  

RSC Advances ◽  
2017 ◽  
Vol 7 (82) ◽  
pp. 52101-52104 ◽  
Author(s):  
Nicolas Sevrain ◽  
Jean-Noël Volle ◽  
Jean-Luc Pirat ◽  
Tahar Ayad ◽  
David Virieux

Asymmetric phosphonylation of aldehydes with trialkyl phosphites mediated by SiCl4 and 1,1′-dibenzyl-bis-(triazolyl)diphenylphosphine dioxide organocatalyst.


1979 ◽  
Vol 44 (7) ◽  
pp. 2092-2095 ◽  
Author(s):  
Josef Pola ◽  
Pavel Engst ◽  
Milan Horák

The CO2 cw laser induced interaction of sulfur hexafluoride with chlorine, silicon tetrachloride, trichlorosilane, and methyltrichlorosilane in a glass reaction vessel has been investigated. The reaction of SF6 with glass surface yielding silicon tetrafluoride and thionyl fluoride was observed. It is inhibited by the products and its rate increases with growing initial pressure (0.6-5.3 kPa) of SF6. Presumed vibrationally excited or dissociated SF6 undergoes the same reaction in the presence of chlorine and silicon tetrachloride, too. The reaction is suppressed by the addition of trichlorosilane and methyltrichlorosilane; in these cases SiF4, SiCl4 and HCl, or SiF4, SiCl4, HCl, acetylene and carbon disulfide are formed. The products indicate a non-sensitizing action of SF6 and a specific reaction channel for the formation of CS2 not attainable by pyrolysis.


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