Plasma emission sources in analytical spectroscopy—III1

Talanta ◽  
1976 ◽  
Vol 23 (1) ◽  
pp. 1-14 ◽  
Author(s):  
S. Greenfield ◽  
H.McD. McGeachin ◽  
P.B. Smith
Keyword(s):  
Emission Sources ◽  
Plasma Emission ◽  
Analytical Spectroscopy

Plasma emission sources in analytical spectroscopy—I

Talanta ◽  
1975 ◽  
Vol 22 (1) ◽  
pp. III-IV ◽  
Author(s):  
S. Greenfield ◽  
H.McD. Mcgeachin ◽  
P.B. Smith
Keyword(s):  
Emission Sources ◽  
Plasma Emission ◽  
Analytical Spectroscopy

Plasma emission sources in analytical spectroscopy—II

Talanta ◽  
1975 ◽  
Vol 22 (7) ◽  
pp. 553-562 ◽  
Author(s):  
S. Greenfield ◽  
H.McD. McGeachin ◽  
P.B. Smith
Keyword(s):  
Emission Sources ◽  
Plasma Emission ◽  
Analytical Spectroscopy

Plasma Emission Sources for High-Current Electron Beam Generation

2008 ◽  
Vol 36 (3) ◽  
pp. 768-777 ◽  
Author(s):  
Y.E. Krasik ◽  
J.Z. Gleizer ◽  
D. Yarmolich ◽  
V. Vekselman ◽  
Y. Hadas ◽  
...  
Keyword(s):  
Electron Beam ◽  
Emission Sources ◽  
Plasma Emission ◽  
High Current ◽  
High Current Electron Beam ◽  
Electron Beam Generation ◽  
Beam Generation ◽  
Current Electron ◽  
High Current Electron

scholarly journals Passive and Active Plasma Emission Sources for High-current Electron Beam Generation

2007 ◽  
Vol 127 (11) ◽  
pp. 697-703 ◽  
Author(s):  
Yakov E. Krasik ◽  
Joseph Z. Gleizer ◽  
Dmitry Yarmolich ◽  
Vladislav Vekselman ◽  
Yoav Hadas ◽  
...  
Keyword(s):  
Electron Beam ◽  
Active Plasma ◽  
Emission Sources ◽  
Plasma Emission ◽  
High Current ◽  
High Current Electron Beam ◽  
Electron Beam Generation ◽  
Beam Generation ◽  
Current Electron ◽  
High Current Electron

Angular size of OH emission regions

1967 ◽  
Vol 31 ◽  
pp. 71-72
Author(s):  
B. F. Burke ◽  
P. P. Crowther ◽  
J. M. Moran ◽  
A. E. E. Rogers ◽  
J. A. Ball ◽  
...  
Keyword(s):  
Angular Size ◽  
Emission Sources ◽  
Ngc 6334

Interferometry gives effective diameters less than 20″ for the OH emission sources in W3and Sgr B2. The sources in W49and NGC 6334 contain two or more components, some of which are smaller than 25″.

High resolution at low voltage: A new approach

1989 ◽  
Vol 47 ◽  
pp. 76-77
Author(s):  
Arthur V. Jones
Keyword(s):  
Low Voltage ◽  
Emission Sources ◽  
New Approach ◽  
Design Concepts ◽  
Probe Diameter ◽  
Low Voltage Operation ◽  
Sufficient Intensity ◽  
Electron Microscopes ◽  
Scanning Electron Microscopes ◽  
Immersion Type

With the introduction of field-emission sources and “immersion-type” objective lenses, the resolution obtainable with modern scanning electron microscopes is approaching that obtainable in STEM and TEM-but only with specific types of specimens. Bulk specimens still suffer from the restrictions imposed by internal scattering and the need to be conducting. Advances in coating techniques have largely overcome these problems but for a sizeable body of specimens, the restrictions imposed by coating are unacceptable.For such specimens, low voltage operation, with its low beam penetration and freedom from charging artifacts, is the method of choice.Unfortunately the technical dificulties in producing an electron beam sufficiently small and of sufficient intensity are considerably greater at low beam energies — so much so that a radical reevaluation of convential design concepts is needed.The probe diameter is usually given by

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