Low energy ion assisted reactive electron beam evaporation of TiO2 and SiO2 films—influence of deposition conditions on optical properties

Vacuum ◽  
1990 ◽  
Vol 40 (1-2) ◽  
pp. 236
Author(s):  
S Mohan ◽  
K Narasimha Rao
Keyword(s):  
Optical Properties ◽  
Electron Beam ◽  
Electron Beam Evaporation ◽  
Low Energy ◽  
Sio2 Films ◽  
Deposition Conditions

Optical Properties of Amorphous Silicon-Yttrium Films

2005 ◽  
Vol 862 ◽  
Author(s):  
Shmyryeva Alexandra N. ◽  
Semikina Tetyana V.
Keyword(s):  
Optical Properties ◽  
Electron Beam ◽  
Amorphous Silicon ◽  
Optical Microscopy ◽  
Electron Beam Evaporation ◽  
Mixed Phase ◽  
Ir Reflection ◽  
Substrate Temperatures

AbstractThis paper presents and discusses the results of measuring IR reflection and ellipsometric parameters, optical microscopy and AFM the mixed phase of amorphous Si:Y films with microcrystalline inclusions. These films were obtained by electron-beam evaporation of siliconyttrium alloys with different Y concentration (5-30 %) at two substrate temperatures (370 and 620 °C).

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