Molecular Beam Epitaxy of GaAsBi and Related Quaternary Alloys

2018 ◽  
pp. 197-209
Author(s):  
Masahiro Yoshimoto ◽  
Kunishige Oe
2018 ◽  
Vol 47 (8) ◽  
pp. 4321-4324
Author(s):  
K. Ichino ◽  
K. Sahashi ◽  
N. Nanba ◽  
T. Nakashima ◽  
Y. Tomita ◽  
...  

1996 ◽  
Vol 68 (25) ◽  
pp. 3608-3610 ◽  
Author(s):  
F. J. Guarin ◽  
S. S. Iyer ◽  
A. R. Powell ◽  
B. A. Ek

1996 ◽  
Vol 159 (1-4) ◽  
pp. 16-20 ◽  
Author(s):  
S.V. Ivanov ◽  
S.V. Sorokin ◽  
P.S. Kop'ev ◽  
J.R. Kim ◽  
H.D. Jung ◽  
...  

2011 ◽  
Vol 14 (2) ◽  
pp. 164-169 ◽  
Author(s):  
M.A. Abid ◽  
H. Abu Hassan ◽  
Z. Hassan ◽  
S.S. Ng ◽  
S.K. Mohd Bakhori ◽  
...  

Author(s):  
C.B. Carter ◽  
D.M. DeSimone ◽  
T. Griem ◽  
C.E.C. Wood

Molecular-beam epitaxy (MBE) is potentially an extremely valuable tool for growing III-V compounds. The value of the technique results partly from the ease with which controlled layers of precisely determined composition can be grown, and partly from the ability that it provides for growing accurately doped layers.


Sign in / Sign up

Export Citation Format

Share Document