Optical emission spectra from plasma during deposition of diamond film were investigated
by an optic multi-channel spectrometer using a CCD array sensor. The diamond film was deposited by
DC plasma enhanced (PE) chemical vapor deposition (CVD) using hydrogen and methane gas
mixture, where substrate was located at near the plasma and the discharge was performed by
intermittent discharge. When Pg during the deposition was increased from 50 to 250 Torr, the optical
emissions of hydrogen (Hα and Hβ) and C2 were increased, and corresponding to these increases,
deposition rate of the diamond film was increased and crystalline quality became superior. When Cm
was changed from 1 to 3 %, the emission from C2 was increased, and whereas, the emission from
hydrogen was decreased. Corresponding to these changes of the emission, the deposition rate of the
film was increased and amorphous component in the deposited film was also increased. These results
show that the increase of C2 results in the increase of the deposition rate, and increase of hydrogen is
effective to eliminate amorphous component, and therefore, monitoring of the optical emission from
hydrogen and C2 is useful for the deposition process of the diamond film.
Optical Emission Spectra of Oxygen Plasma Produced by Radio-Frequency Plasma
