Ultraviolet Light Resistance of Vinyl Miniblinds Part 2. Reaction Products Formed by Lead in Air

1999 ◽  
pp. 277-280
Author(s):  
Richard F. Grossman
2012 ◽  
Vol 2012 (0) ◽  
pp. _J191012-1-_J191012-5
Author(s):  
Tokumitsu MOURI ◽  
Takashi NAKAMURA ◽  
Hiroyuki OGUMA ◽  
Kensuke MIYAMOTO

1997 ◽  
Vol 3 (4) ◽  
pp. 279-280 ◽  
Author(s):  
Richard F. Grossman ◽  
Dale Krausnick

1973 ◽  
Vol 15 (4) ◽  
pp. 831-844 ◽  
Author(s):  
G. R. Hoffmann ◽  
H. V. Malling ◽  
T. J. Mitchell

Mutants resistant to inhibitory concentrations of 5-fluorodeoxyuridine (FdUrd) were induced by ultraviolet light. Resistance was demonstrated by growth-tube experiments and by plating efficiencies in the presence and in the absence of FdUrd. Linkage studies involving five mutants revealed the existence of at least two loci conferring resistance to the inhibitor. These loci, designated fdu-1 and fdu-2, were assigned to Linkage Groups VII and IV, respectively. Both resistance genes are recessive to their sensitive alleles in heterokaryons. Resistance to FdUrd is stable both in the presence and in the absence of the inhibitor. Possible mechanisms of resistance to FdUrd are discussed.


2013 ◽  
Vol 2013 (0) ◽  
pp. _J191026-1-_J191026-3
Author(s):  
Takashi NAKAMURA ◽  
Hiroyuki Shizuka ◽  
Hiroyuki OGUMA

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