Fiducial inference-based failure mechanism consistency analysis for accelerated life and degradation tests

Author(s):  
Kai Song ◽  
Lirong Cui
1993 ◽  
Vol 36 (4) ◽  
pp. 39-45
Author(s):  
J. Hu ◽  
D. Barker ◽  
A. Dasgupta ◽  
A. Arora

Accelerated life testing techniques provide a short-cut method to investigate the reliability of electronic devices with respect to certain dominant failure mechanisms that occur under normal operating conditions. However, accelerated tests have often been conducted without knowledge of the failure mechanisms and without ensuring that the test accelerated the same mechanism as that obscrved under normal operating conditions. This paper summarizes common failure mechanisms in electronic devices and packages and investigates possible failure mechanism shifting during accelerated testing.


2014 ◽  
Vol 35 (8) ◽  
pp. 084010 ◽  
Author(s):  
Chunsheng Guo ◽  
Yanfeng Zhang ◽  
Ning Wan ◽  
Hui Zhu ◽  
Shiwei Feng

Author(s):  
Jin Young Kim ◽  
R. E. Hummel ◽  
R. T. DeHoff

Gold thin film metallizations in microelectronic circuits have a distinct advantage over those consisting of aluminum because they are less susceptible to electromigration. When electromigration is no longer the principal failure mechanism, other failure mechanisms caused by d.c. stressing might become important. In gold thin-film metallizations, grain boundary grooving is the principal failure mechanism.Previous studies have shown that grain boundary grooving in gold films can be prevented by an indium underlay between the substrate and gold. The beneficial effect of the In/Au composite film is mainly due to roughening of the surface of the gold films, redistribution of indium on the gold films and formation of In2O3 on the free surface and along the grain boundaries of the gold films during air annealing.


Author(s):  
C. Manandhar ◽  
M. Hossain ◽  
P. Nelson ◽  
C. Hobson
Keyword(s):  

2008 ◽  
Vol 11 (-1) ◽  
pp. 188-201 ◽  
Author(s):  
Piotr Bogacz ◽  
Jarosława Kaczmarek ◽  
Danuta Leśniewska

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