Dependence of mark size on STM pulse voltage in heat-assisted magnetic probe recording on a cobalt–nickel–platinum thin film

2008 ◽  
Vol 8 (1) ◽  
pp. 57-60 ◽  
Author(s):  
Zhiyong Zhong ◽  
Li Zhang ◽  
Huaiwu Zhang
Keyword(s):  
Thin Film ◽  
Magnetic Probe ◽  
Pulse Voltage ◽  
Cobalt Nickel ◽  
Nickel Platinum ◽  
Platinum Thin Film ◽  
Probe Recording

Uncooled bolometer for millimeter-wave detection using manganese-cobalt-nickel-oxide thin film

2020 ◽  
Vol 13 (12) ◽  
pp. 124002
Author(s):  
Tao Hu ◽  
Wanli Ma ◽  
Jing Wu ◽  
Zhibo Zhang ◽  
Wei Zhou ◽  
...  
Keyword(s):  
Thin Film ◽  
Nickel Oxide ◽  
Millimeter Wave ◽  
Oxide Thin Film ◽  
Wave Detection ◽  
Cobalt Nickel ◽  
Cobalt Nickel Oxide ◽  
Nickel Oxide Thin Film

Low Temperature Silicides for Poly-Silicon Thin Film Transistor Applications

1995 ◽  
Vol 402 ◽  
Author(s):  
G. T. Sarcona ◽  
M. K. Hatalis
Keyword(s):  
Thin Film ◽  
Sheet Resistance ◽  
Thin Film Transistor ◽  
Surface Preparation ◽  
Silicon Thin Film ◽  
Active Matrix ◽  
Cobalt Nickel ◽  
Silicon Materials ◽  
Cobalt Silicides ◽  
Matrix Liquid

AbstractThin films of cobalt, nickel, and tungsten were sputtered on three types of silicon materials to explore their potential for use as silicides in thin film transistor technologies for active matrix liquid crystal displays. The metals were sputtered onto single-crystal, polycrystalline, and amorphous silicon. The metals were annealed in vacuum after deposition over temperatures ranging from 250°C to 750°C. The sheet resistance of the resulting silicide films was measured using a four point probe apparatus. Cobalt silicides with sheet resistance of less than 4 Ω/ were formed at 600°C. Nickel produced films with sheet resistance below 10 Ω/▪ at 350°C, though the surface was required to be vacuum-clean. In this study, tungsten did not produce silicides. Surface preparation has been found to be an important factor in tungsten and nickel silicidation.

Microscopic and Nanoscopic Three-Phase-Boundaries of Platinum Thin-Film Electrodes on YSZ Electrolyte

2010 ◽  
Vol 21 (3) ◽  
pp. 565-572 ◽  
Author(s):  
Thomas Ryll ◽  
Henning Galinski ◽  
Lukas Schlagenhauf ◽  
Pierre Elser ◽  
Jennifer L. M. Rupp ◽  
...  
Keyword(s):  
Thin Film ◽  
Phase Boundaries ◽  
Three Phase ◽  
Thin Film Electrodes ◽  
Ysz Electrolyte ◽  
Platinum Thin Film

Voltammetric determination of iron(III) using sputtered platinum thin film

2019 ◽  
Vol 320 ◽  
pp. 134607 ◽  
Author(s):  
Linh Duy Nguyen ◽  
Tung Son Vinh Nguyen ◽  
Tien Minh Huynh ◽  
Robert Baptist ◽  
Tin Chanh Duc Doan ◽  
...  
Keyword(s):  
Thin Film ◽  
Voltammetric Determination ◽  
Platinum Thin Film

The synthesis of heterobimetallic systems based on a hexatertiaryphosphine ligand system: cobalt-nickel and nickel-platinum complexes

Polyhedron ◽  
1990 ◽  
Vol 9 (10) ◽  
pp. 1317-1321 ◽  
Author(s):  
Suzanne E. Saum ◽  
Fredric R. Askham ◽  
Scott A. Laneman ◽  
George G. Stanley
Keyword(s):  
Platinum Complexes ◽  
Ligand System ◽  
Cobalt Nickel ◽  
Nickel Platinum
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