scholarly journals Thick heavily boron doped CVD diamond films homoepitaxially grown on (111)-oriented substrates

2017 ◽  
Vol 79 ◽  
pp. 108-111 ◽  
Author(s):  
A. Boussadi ◽  
A. Tallaire ◽  
O. Brinza ◽  
M.A. Pinault-Thaury ◽  
J. Achard
2010 ◽  
Vol 61 (3) ◽  
pp. 274-278 ◽  
Author(s):  
Sadao TAKEUCHI ◽  
Takashi MURAISHI

2005 ◽  
Vol 27 (7) ◽  
pp. 1231-1234 ◽  
Author(s):  
J.A.N. Gonçalves ◽  
G.M. Sandonato ◽  
R. Meléndrez ◽  
V. Chernov ◽  
M. Pedroza-Montero ◽  
...  

1997 ◽  
Vol 46 (1-3) ◽  
pp. 112-114 ◽  
Author(s):  
Yu. Boiko ◽  
P. Gonon ◽  
S. Prawer ◽  
D.N. Jamieson

2006 ◽  
Vol 15 (11-12) ◽  
pp. 1972-1975 ◽  
Author(s):  
V.I. Polyakov ◽  
A.I. Rukovishnikov ◽  
L.A. Avdeeva ◽  
Z.E. Kun'kova ◽  
V.P. Varnin ◽  
...  

2007 ◽  
Vol 1039 ◽  
Author(s):  
Paul William May ◽  
William J Ludlow ◽  
Matthew Hannaway ◽  
James A Smith ◽  
Keith N Rosser ◽  
...  

AbstractWe present data showing how the electrical conductivity and Raman spectra of boron doped ‘cauliflower’-type nanocrystalline (c-NCD) CVD diamond films vary as a function of B content. The conductivity is roughly linear as a function of B content between an onset threshold of ∼5×1020 cm−3 up to ∼6×1021 cm−3, with the higher concentrations giving near metallic conductivity values. The onset threshold may be due to compensating donors due to the large number of impurities and defects in these films. The position of the Lorentzian contribution to the 500 cm−1 Raman feature was used to estimate the B content and compared to the value measured using SIMS. We found that the Raman method overestimated the concentration of B by a factor of ∼5 for these c-NCD films. The shortfall may be explained if only a small fraction of the B found in the small-grained films is being incorporated into substitutional sites. We conclude that in diamond films with a high concentration of grain boundaries, the majority of the B (80% in some cases) must be present at or in the grain boundaries.


1998 ◽  
Vol 3 (1) ◽  
pp. 25-30 ◽  
Author(s):  
Yuri Pleskov ◽  
Alik Tameev ◽  
Valentin Varnin ◽  
Irina Teremetskaya

2010 ◽  
Vol 312 (12-13) ◽  
pp. 1986-1991 ◽  
Author(s):  
Hongdong Li ◽  
Tong Zhang ◽  
Liuan Li ◽  
Xianyi Lü ◽  
Bo Li ◽  
...  

2016 ◽  
Vol 66 ◽  
pp. 61-66 ◽  
Author(s):  
A. Tallaire ◽  
A. Valentin ◽  
V. Mille ◽  
L. William ◽  
M.A. Pinault-Thaury ◽  
...  

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