Controllable morphologies and electrochemical properties of graphitizing MCMB-based hybrids with nanostructure via a simple chemical vapor deposition method

One of the phosphorus allotropes called greenish phosphorus was successfully synthesized by simple chemical vapor deposition method. We revealed that the critical factors in the formation mechanism of greenish phosphorus...

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A Simple Chemical Vapor Deposition Method for the Production of Highly Conductive Polymer Poly(3,4-ethylenedioxythiophene)

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2013.7432 ◽

2013 ◽

Vol 13 (6) ◽

pp. 4045-4051 ◽

Cited By ~ 1

Author(s):

Dalmau Reig-i-Plessis ◽

Eugen Panaitescu ◽

Akshai Baskaran ◽

Latika Menon

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Conductive Polymer ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Simple Chemical

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Uniform diameter multi-walled carbon nanotubes with a controlled wall number obtained by a simple chemical vapor deposition method

Chemical Physics Letters ◽

10.1016/j.cplett.2012.10.028 ◽

2012 ◽

Vol 554 ◽

pp. 137-142 ◽

Cited By ~ 10

Author(s):

Youqin Lin ◽

Anthony Dichiara ◽

Delong He ◽

Paul Haghi-Ashtiani ◽

Jinbo Bai

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Simple Chemical ◽

Multi Walled Carbon Nanotubes ◽

Uniform Diameter ◽

Walled Carbon Nanotubes

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The growth and characterization of ZnSe nanoneedles by a simple chemical vapor deposition method

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2005.11.098 ◽

2006 ◽

Vol 289 (2) ◽

pp. 440-444 ◽

Cited By ~ 16

Author(s):

Hongzhi Fu ◽

Huanyong Li ◽

Wanqi Jie ◽

Lan Yang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Simple Chemical

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Synthesis and electrochemical characterization of LiFePO4/C-polypyrrole composite prepared by a simple chemical vapor deposition method

Journal of Solid State Electrochemistry ◽

10.1007/s10008-011-1538-x ◽

2011 ◽

Vol 16 (4) ◽

pp. 1383-1388 ◽

Cited By ~ 16

Author(s):

Qiang Gong ◽

Yu-Shi He ◽

Yang Yang ◽

Xiao-Zhen Liao ◽

Zi-Feng Ma

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Electrochemical Characterization ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Simple Chemical ◽

Polypyrrole Composite

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Controllable synthesis and characterization of tube brush-like ZnO nanowires produced via a simple chemical vapor deposition method

Applied Physics A ◽

10.1007/s00339-009-5478-6 ◽

2009 ◽

Vol 98 (3) ◽

pp. 491-497 ◽

Cited By ~ 17

Author(s):

Ya-Qing Bie ◽

Zhi-Min Liao ◽

Hong-Jun Xu ◽

Xin-Zheng Zhang ◽

Xu-Dong Shan ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Zno Nanowires ◽

Synthesis And Characterization ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Controllable Synthesis ◽

Simple Chemical

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Improving the electrochemical properties of SiO@C anode for high-energy lithium ion battery by adding graphite through fluidization thermal chemical vapor deposition method

Ceramics International ◽

10.1016/j.ceramint.2018.10.088 ◽

2019 ◽

Vol 45 (2) ◽

pp. 1950-1959 ◽

Cited By ~ 11

Author(s):

Mao Xia ◽

Yiran Li ◽

Zhi Zhou ◽

Yufan Wu ◽

Nan Zhou ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrochemical Properties ◽

Lithium Ion Battery ◽

Vapor Deposition ◽

Lithium Ion ◽

Chemical Vapor ◽

High Energy ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Thermal Chemical Vapor Deposition

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Cycling Characteristics of MgH2 madeby Hydriding Chemical Vapor Deposition Method

Korean Journal of Metals and Materials ◽

10.3365/kjmm.2011.49.12.945 ◽

2011 ◽

Vol 49 (12) ◽

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method

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Anisotropic Plasma ChemicalVapor Deposition of Copper Films in Trenches

MRS Proceedings ◽

10.1557/proc-766-e3.8 ◽

2003 ◽

Vol 766 ◽

Author(s):

Kosuke Takenaka ◽

Masao Onishi ◽

Manabu Takenshita ◽

Toshio Kinoshita ◽

Kazunori Koga ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Deposition Rate ◽

Vapor Deposition ◽

Chemical Vapor ◽

Anisotropic Plasma ◽

Bottom Surface ◽

Chemical Vapor Deposition Method ◽

Copper Films ◽

Deposition Method ◽

Via Holes

AbstractAn ion-assisted chemical vapor deposition method by which Cu is deposited preferentially from the bottom of trenches (anisotropic CVD) has been proposed in order to fill small via holes and trenches. By using Ar + H2 + C2H5OH[Cu(hfac)2] discharges with a ratio H2 / (H2 + Ar) = 83%, Cu is filled preferentially from the bottom of trenches without deposition on the sidewall and top surfaces. The deposition rate on the bottom surface of trenches is experimentally found to increase with decreasing its width.

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