Active sites on Cu/SiO2 prepared using the atomic layer epitaxy technique for a low-temperature water–gas shift reaction
2009 ◽
Vol 263
(1)
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pp. 155-166
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2000 ◽
Vol 27
(3)
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pp. 179-191
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2005 ◽
Vol 279
(1-2)
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pp. 195-203
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2015 ◽
Vol 5
(7)
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pp. 3706-3713
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