ABSTRACTThe hydrogen storage properties of nanostructured Mg and MgH2 thin films were studied as created by Ar and Ar+H2 plasma sputter deposition. Columnar structures with typical widths of ∼120 nm are observed with their long columnar axis extending throughout the thickness of the films. Applying substrate bias voltages during deposition results in narrower columns. A concomitant reduction in hydrogen desorption temperature from 400 °C to 360 °C is observed. Capping the Mg films with a ∼100 nm thin Pd layer leads to significantly reduced hydrogen desorption temperatures of ∼200 °C induced by the catalytic activity of the Pd cap layer. Also, hydrogen permeation of the films is strongly improved. The rate-determining factor is found to be the dissociation of the hydrogen molecules. Optimum hydrogen loading conditions of the Pd/Mg films were obtained just above ∼200 °C at hydrogen pressures of 0.25–1.0 MPa, resulting in hydrogen storage capacities in the range of 4–7 wt%.
Hydrogen storage characteristics of Ti– and V–based thin films
