Pattern formation of cytochrome c by microcontact printing and dip-pen nanolithography

2004 ◽  
Vol 24 (1-2) ◽  
pp. 151-155 ◽  
Author(s):  
Sang Kyu Kwak ◽  
Gil Sun Lee ◽  
Dong June Ahn ◽  
Jeong Woo Choi
Keyword(s):  
Pattern Formation ◽  
Cytochrome C ◽  
Microcontact Printing ◽  
Dip Pen Nanolithography

Protein Immobilization on Ni(II) Ion Patterns Prepared by Microcontact Printing and Dip-Pen Nanolithography

ACS Nano ◽  
2010 ◽  
Vol 4 (2) ◽  
pp. 1083-1091 ◽  
Author(s):  
Chien-Ching Wu ◽  
David N. Reinhoudt ◽  
Cees Otto ◽  
Aldrik H. Velders ◽  
Vinod Subramaniam
Keyword(s):  
Microcontact Printing ◽  
Protein Immobilization ◽  
Dip Pen Nanolithography

Supramolecular Microcontact Printing and Dip-Pen Nanolithography on Molecular Printboards

2005 ◽  
Vol 11 (13) ◽  
pp. 3988-3996 ◽  
Author(s):  
Christiaan M. Bruinink ◽  
Christian A. Nijhuis ◽  
Mária Péter ◽  
Barbara Dordi ◽  
Olga Crespo-Biel ◽  
...  
Keyword(s):  
Microcontact Printing ◽  
Dip Pen Nanolithography

Comparison between Patterns Generated by Microcontact Printing and Dip-Pen Nanolithography on InP Surfaces

2007 ◽  
Vol 111 (49) ◽  
pp. 17989-17992 ◽  
Author(s):  
Heeyeon P. Wampler ◽  
Dmitry Y. Zemlyanov ◽  
Albena Ivanisevic
Keyword(s):  
Microcontact Printing ◽  
Dip Pen Nanolithography

Molecular pattern formation using chemically modified cytochrome c

2002 ◽  
Vol 23 (4) ◽  
pp. 295-303 ◽  
Author(s):  
Jeong-Woo Choi ◽  
Sei-Jeong Park ◽  
Yun-Suk Nam ◽  
Won Hong Lee ◽  
Masamichi Fujihira
Keyword(s):  
Pattern Formation ◽  
Cytochrome C ◽  
Chemically Modified ◽  
Molecular Pattern

Properties of Polyelectrolyte Templates Generated by Dip-Pen Nanolithography and Microcontact Printing

2004 ◽  
Vol 16 (25) ◽  
pp. 5216-5219 ◽  
Author(s):  
Dorjderem Nyamjav ◽  
Albena Ivanisevic
Keyword(s):  
Microcontact Printing ◽  
Dip Pen Nanolithography

scholarly journals Electroless Nanoparticle Film Deposition Compatible with Photolithography, Microcontact Printing, and Dip-Pen Nanolithography Patterning Technologies

Nano Letters ◽  
2002 ◽  
Vol 2 (12) ◽  
pp. 1369-1372 ◽  
Author(s):  
Lon A. Porter ◽  
Hee Cheul Choi ◽  
J. M. Schmeltzer ◽  
Alexander E. Ribbe ◽  
Lindsay C. C. Elliott ◽  
...  
Keyword(s):  
Microcontact Printing ◽  
Film Deposition ◽  
Nanoparticle Film ◽  
Dip Pen Nanolithography

Joining Dip-Pen Nanolithography and Microcontact Printing Into a Nanolithographic Process: From Engineering Design to Parallel Fabrication

2004 ◽  
Author(s):  
Matthew S. Johannes ◽  
Robert L. Clark ◽  
Daniel G. Cole
Keyword(s):  
Microcontact Printing ◽  
Inorganic Materials ◽  
Ambient Conditions ◽  
Design Environment ◽  
Original Design ◽  
Promising Technique ◽  
The Creation ◽  
Afm Cantilever ◽  
Parallel Fashion ◽  
Dip Pen Nanolithography

One nanomanufacturing concern is the precise, controlled deposition of materials at the nanoscale, commonly referred to as nanolithography. One promising technique, dip-pen nanolithography (DPN), can deposit a multitude of organic and inorganic materials. Simple and accurate, DPN uses an atomic force microscope (AFM) cantilever to deposit inks under ambient conditions. However, from a manufacturing perspective, DPN’s main drawback is its inherent serial nature. Another more promising technique is microcontact printing (μCP), which can repeatedly cover larger areas in a parallel fashion. As interest in nanomanufacturing processes increases, the demand for user-friendly, automated nanolithography processes become a priority. This paper presents a nanolithography process that begins with a design plan and ends with a manufactured product using a unique progression from design environment to serial nanolithographic technique to parallel nanolithographic technique. The process begins with the creation of a design template using conventional CAD software. The design template is then transformed into a vector signal that serves as input to the AFM used in the DPN process. A custom AFM has been designed for nanometer scale precision in three axes using real-time, digital feedback methodologies. Using the appropriate DPN ‘ink’ coated on the AFM cantilever, the design template is automatically reproduced onto the substrate, where the appropriate features are filled in with predetermined chemical functionalities. Specifically, alkanethiol chemistry is used as a resist for wet chemical etching of a gold substrate to create raised surface features which mimic the original design template. This substrate is used as a positive mask for the creation of polymeric stamps for μCP. These stamps are then used to create replicas of the original design template in a parallel fashion and qualitatively examined for their completeness and reproducibility.

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