Erratum to “New method of the precise measurement for the thickness and bulk etch rate of the solid-state track detector”

Author(s):  
S. Kodaira ◽  
N. Yasuda ◽  
N. Hasebe ◽  
T. Doke ◽  
S. Ota ◽  
...  
2015 ◽  
Vol 1107 ◽  
pp. 712-715
Author(s):  
Anees A. Al-Hamzawi ◽  
M.S. Jaffar ◽  
Nada F. Tawfiq ◽  
Murtadha Sh. Aswood

In the current study, the bulk etch rate VBof solid state nuclear track detectors SSNTDs CR-39 have been examined at different concentrations of NaOH solution ranged from 4N to 8N and different temperatures of NaOH solution (50, 60, 70, 80°C) for various time intervals of etching (1-10 h); this is done by determination of mass variation via etching time. The results indicate that the bulk etch rate VBincreases with the increase of etchant solution concentration and the temperature of solution. This can be attributed to the increase the thickness of the removed layers h of the detector.


2019 ◽  
Vol 28 (12) ◽  
pp. 1950110 ◽  
Author(s):  
R. K. Jain ◽  
S. Kumar ◽  
A. Kumar ◽  
Aniket Kumar ◽  
M. K. Singh ◽  
...  

This study gives information about the effects of UV (here, the wavelength is 160 nm) exposure on the bulk etch rate ([Formula: see text], track etch rate ([Formula: see text], the detector sensitivity ([Formula: see text], critical angle ([Formula: see text] and etching efficiency ([Formula: see text] of Makrofol-E Solid State Nuclear Track Detector. The effect of UV on the activation energy of Makrofol-E was also studied. Nine pieces of Makrofol-E Solid State Nuclear Track Detector were separated into three equal sets as set A, set B and set C. Set A, named as reference set (Fission fragment FF), was irradiated to [Formula: see text]Cf source. Set B, called as post-exposed ([Formula: see text]), was first irradiated to [Formula: see text]Cf and then exposed to UV. The process was reversed for set C named as pre-exposed ([Formula: see text]) at the same conditions. From the results, it is concluded that radiation produces small but significant effect on activation energy [Formula: see text] of bulk etch rate for pre-exposed and post-exposed samples. Also, the activation energies [Formula: see text] of track etch rate for post-exposed and Fission fragment samples are within experimental uncertainty. The energy carried by UV radiation may be responsible for cross networking processes occurring during the exposure which results small change in activation energies for both [Formula: see text] and [Formula: see text]. The [Formula: see text] can be increased by hardening detector material of the pre-exposed detector.


2003 ◽  
Vol 37 (2) ◽  
pp. 119-125 ◽  
Author(s):  
Tomoya Yamauchi ◽  
A. EL-Rahmany ◽  
Daisuke Mineyama ◽  
Hirotake Nakai ◽  
Keiji Oda

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