Effects of Bi:V ratio and oxygen pressure on BiVO4(010) epitaxial thin film preparation

2021 ◽  
pp. 413174
Author(s):  
Yuxin Shi ◽  
Pengwei Zhai ◽  
Lixiang Meng ◽  
Zongyin Huang ◽  
Guoqiang Li
Keyword(s):  
Thin Film ◽  
Oxygen Pressure ◽  
Epitaxial Thin Film ◽  
Thin Film Preparation ◽  
Film Preparation

Can We Trust on the Thermal Analysis of Metal Organic Powders for thin film preparation?

2012 ◽  
Vol 1449 ◽  
Author(s):  
Jordi Farjas ◽  
Daniel Sanchez-Rodriguez ◽  
Hichem Eloussifi ◽  
Raul Cruz Hidalgo ◽  
Pere Roura ◽  
...  
Keyword(s):  
Thin Film ◽  
Thermal Analysis ◽  
Thermal Analyses ◽  
Heat And Mass Transport ◽  
Analysis Techniques ◽  
Thin Film Preparation ◽  
Metal Organic ◽  
Organic Precursors ◽  
Film Preparation ◽  
Thermal Analysis Techniques

ABSTRACTThermal analysis techniques are routinely applied to characterize the thermal behavior of metal organic precursors used for oxide film preparation. Since the mass of films is very low, researchers do their thermal analyses on powders and consider that the results are representative of films. We will show here that, in general, this assumption is not true. Several examples involving precursors of YBa2Cu3O7-x (Ba and Y trifluoroacetates and Ba propionate) will serve to appreciate that films can behave very differently than powders due to their enhanced heat and mass transport paths. Ultimately, we will demonstrate that, in some cases, relying on powders thermal analysis may lead to erroneous conclusions.

Low voltage magnetron discharges for thin film preparation

Vacuum ◽  
1991 ◽  
Vol 42 (1-2) ◽  
pp. 39-41 ◽  
Author(s):  
K Steenbeck ◽  
E Steinbeiß ◽  
S Winkler ◽  
G Schmidt ◽  
G Bruchlos
Keyword(s):  
Thin Film ◽  
Low Voltage ◽  
Thin Film Preparation ◽  
Film Preparation

scholarly journals Superconding thin film preparation in the presence of an oxygen radical beam.

Shinku ◽  
1991 ◽  
Vol 34 (3) ◽  
pp. 226-228
Author(s):  
Shuji KOMURO ◽  
Patrick O'KEEFFE ◽  
Shoji DEN ◽  
Takitaro MORIKAWA ◽  
Yoshinobu AOYAGI
Keyword(s):  
Thin Film ◽  
Oxygen Radical ◽  
Thin Film Preparation ◽  
Film Preparation

Optical emission study of the laser plasma plume produced during diamondlike carbon thin film preparation

1998 ◽  
Vol 316 (1-2) ◽  
pp. 40-44 ◽  
Author(s):  
Shin-ichi Aoqui ◽  
Tomoaki Ikegami ◽  
Yukihiko Yamagata ◽  
Kenji Ebihara
Keyword(s):  
Thin Film ◽  
Laser Plasma ◽  
Plasma Plume ◽  
Optical Emission ◽  
Carbon Thin Film ◽  
Diamondlike Carbon ◽  
Thin Film Preparation ◽  
Film Preparation ◽  
Emission Study

Sputtered Cadmium Sulfide (CdS) Buffer Layer for Kesterite and Chalcogenide Thin Film Solar Cell (TFSC) Applications

2020 ◽  
Vol 20 (6) ◽  
pp. 3909-3912 ◽  
Author(s):  
Muhunthan Nadarajah ◽  
Kuldeep Singh Gour ◽  
Vidya Nand Singh
Keyword(s):  
Thin Film ◽  
Cadmium Sulfide ◽  
Radio Frequency Magnetron Sputtering ◽  
Raman Analysis ◽  
Tauc Plot ◽  
Cds Thin Film ◽  
Thin Film Preparation ◽  
Film Preparation ◽  
Cds Film ◽  
Chalcogenide Thin Film

In this study, we present a process to deposit cadmium sulfide (CdS) thin film on glass substrate using in-house made CdS sputter target deposited by RF (radio frequency) magnetron sputtering. The bandgap of CdS film was about 2.4 eV estimated using tauc plot. Structural analysis was done using XRD and highest peak is at (101) and two other small peaks at (100) and (110) confirm CdS phase. Raman analysis was done for further confirmation of phases present in CdS film where peaks at 299.97 cm−1 and 599.8 cm−1 showed phase pure CdS film. The sputtering method used for CdS thin film preparation is an industrially viable technique and can be used for in line mass production.

Effects of cross-magnetic field on thin film preparation by pulsed Nd/YAG laser deposition

2000 ◽  
Vol 374 (2) ◽  
pp. 278-281 ◽  
Author(s):  
Hiroharu Kawasaki ◽  
Kazuya Doi ◽  
Satoshi Hiraishi ◽  
Yoshiaki Suda
Keyword(s):  
Magnetic Field ◽  
Thin Film ◽  
Laser Deposition ◽  
Yag Laser ◽  
Thin Film Preparation ◽  
Film Preparation

Thin Film Preparation of Hydrogen Storage Alloys and Their Characteristics as Metal Hydride Electrodes

1991 ◽  
Vol 138 (4) ◽  
pp. 908-915 ◽  
Author(s):  
T. Sakai ◽  
H. Ishikawa ◽  
H. Miyamura ◽  
N. Kuriyama ◽  
S. Yamada ◽  
...  
Keyword(s):  
Thin Film ◽  
Hydrogen Storage ◽  
Metal Hydride ◽  
Hydrogen Storage Alloys ◽  
Thin Film Preparation ◽  
Film Preparation ◽  
Metal Hydride Electrodes
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