Abstract
FeSi films with different substrate temperature (Ts) were deposited on MgO (001) substrates by a radio frequency magnetron sputtering. During the change of crystal structure from amorphous epitaxial state, magnetic anisotropy experienced three stages: dominant uniaxial magnetic anisotropy (Ts < 400 ℃) and enhanced cubic magnetocrystalline anisotropy (400 ℃ £ Ts £ 600 ℃) and weak cubic magnetocrystalline anisotropy (Ts = 700 ℃ and 800 ℃). In addition, resonance frequency ƒr firstly decreases, then reaches the maximum value, and finally disappears due to the large coercivity field. These results demonstrate the correlation between the structure, static, dynamic magnetic properties of FeSi films, and provide an effective method to prepare soft films with deterministic uniaxial or cubic magnetic anisotropy for practical application.