Effects of cross-magnetic field on thin film preparation by pulsed Nd/YAG laser deposition

2000 ◽  
Vol 374 (2) ◽  
pp. 278-281 ◽  
Author(s):  
Hiroharu Kawasaki ◽  
Kazuya Doi ◽  
Satoshi Hiraishi ◽  
Yoshiaki Suda
Keyword(s):  
Magnetic Field ◽  
Thin Film ◽  
Laser Deposition ◽  
Yag Laser ◽  
Thin Film Preparation ◽  
Film Preparation

scholarly journals Titanium Oxide Thin Film Preparation by Pulsed Laser Deposition Method Using a Powder Target

2013 ◽  
Vol 38 (1) ◽  
pp. 69-72 ◽  
Author(s):  
Hiroharu Kawasaki ◽  
Daichi Taniyama ◽  
Tamiko Ohshima ◽  
Takeshi Ihara ◽  
Yoshihito Yagyu ◽  
...  
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Titanium Oxide ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Film ◽  
Deposition Method ◽  
Powder Target ◽  
Thin Film Preparation ◽  
Film Preparation

Thin-film preparation by back-surface irradiation pulsed laser deposition using metal powder targets

2016 ◽  
Vol 56 (1S) ◽  
pp. 01AB06 ◽  
Author(s):  
Hiroharu Kawasaki ◽  
Tamiko Ohshima ◽  
Yoshihito Yagyu ◽  
Takeshi Ihara ◽  
Makiko Yamauchi ◽  
...  
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Metal Powder ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Back Surface ◽  
Thin Film Preparation ◽  
Film Preparation

Effects of Bi:V ratio and oxygen pressure on BiVO4(010) epitaxial thin film preparation

2021 ◽  
pp. 413174
Author(s):  
Yuxin Shi ◽  
Pengwei Zhai ◽  
Lixiang Meng ◽  
Zongyin Huang ◽  
Guoqiang Li
Keyword(s):  
Thin Film ◽  
Oxygen Pressure ◽  
Epitaxial Thin Film ◽  
Thin Film Preparation ◽  
Film Preparation

Can We Trust on the Thermal Analysis of Metal Organic Powders for thin film preparation?

2012 ◽  
Vol 1449 ◽  
Author(s):  
Jordi Farjas ◽  
Daniel Sanchez-Rodriguez ◽  
Hichem Eloussifi ◽  
Raul Cruz Hidalgo ◽  
Pere Roura ◽  
...  
Keyword(s):  
Thin Film ◽  
Thermal Analysis ◽  
Thermal Analyses ◽  
Heat And Mass Transport ◽  
Analysis Techniques ◽  
Thin Film Preparation ◽  
Metal Organic ◽  
Organic Precursors ◽  
Film Preparation ◽  
Thermal Analysis Techniques

ABSTRACTThermal analysis techniques are routinely applied to characterize the thermal behavior of metal organic precursors used for oxide film preparation. Since the mass of films is very low, researchers do their thermal analyses on powders and consider that the results are representative of films. We will show here that, in general, this assumption is not true. Several examples involving precursors of YBa2Cu3O7-x (Ba and Y trifluoroacetates and Ba propionate) will serve to appreciate that films can behave very differently than powders due to their enhanced heat and mass transport paths. Ultimately, we will demonstrate that, in some cases, relying on powders thermal analysis may lead to erroneous conclusions.

Low voltage magnetron discharges for thin film preparation

Vacuum ◽  
1991 ◽  
Vol 42 (1-2) ◽  
pp. 39-41 ◽  
Author(s):  
K Steenbeck ◽  
E Steinbeiß ◽  
S Winkler ◽  
G Schmidt ◽  
G Bruchlos
Keyword(s):  
Thin Film ◽  
Low Voltage ◽  
Thin Film Preparation ◽  
Film Preparation
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