Solvent annealing assisted self-assembly of hydrogen-bonded interpolymer complexes of AB block copolymer/C homopolymer in thin film

Polymer ◽  
2010 ◽  
Vol 51 (21) ◽  
pp. 4836-4842 ◽  
Author(s):  
Chao Wang ◽  
Tingmei Wang ◽  
Qihua Wang
2015 ◽  
Vol 2015 ◽  
pp. 1-10
Author(s):  
Colm T. O’Mahony ◽  
Dipu Borah ◽  
Michael A. Morris

Block copolymer (BCP) lithography makes use of the microphase separation properties of BCPs to pattern ordered nanoscale features over large areas. This work presents the microphase separation of an asymmetric polystyrene-block-poly(ferrocenyl dimethylsilane) (PS-b-PFS) BCP that allows ordered arrays of nanostructures to be formed by spin casting PS-b-PFS on substrates and subsequent solvent annealing. The effects of the solvent annealing conditions on self-assembly and structural stability are discussed.


2019 ◽  
Vol 7 (5) ◽  
pp. 1901747
Author(s):  
Nils Demazy ◽  
Cian Cummins ◽  
Karim Aissou ◽  
Guillaume Fleury

2020 ◽  
Vol 53 (3) ◽  
pp. 1098-1113 ◽  
Author(s):  
Gregory S. Doerk ◽  
Ruipeng Li ◽  
Masafumi Fukuto ◽  
Kevin G. Yager

2015 ◽  
Vol 3 (12) ◽  
pp. 2837-2847 ◽  
Author(s):  
N. Yamashita ◽  
S. Watanabe ◽  
K. Nagai ◽  
M. Komura ◽  
T. Iyoda ◽  
...  

Chemical epitaxy with a density multiplication process was applied to the perpendicularly oriented hexagonal cylinder nanostructure of liquid crystalline block copolymer (PEO-b-PMA(Az)) thin film through thermally induced microphase separation by using a newly designed PMA(Az)24 brush.


Sign in / Sign up

Export Citation Format

Share Document