Directed Block Copolymer Thin Film Self-Assembly: Emerging Trends in Nanopattern Fabrication

Chemical epitaxy with a density multiplication process was applied to the perpendicularly oriented hexagonal cylinder nanostructure of liquid crystalline block copolymer (PEO-b-PMA(Az)) thin film through thermally induced microphase separation by using a newly designed PMA(Az)24 brush.

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Self-assembly morphology effects on the crystallization of semicrystalline block copolymer thin film

The Journal of Chemical Physics ◽

10.1063/1.2711437 ◽

2007 ◽

Vol 126 (10) ◽

pp. 104902 ◽

Cited By ~ 5

Author(s):

Yuhan Wei ◽

Caiyuan Pan ◽

Binyao Li ◽

Yanchun Han

Keyword(s):

Thin Film ◽

Block Copolymer ◽

Self Assembly

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Thin Film Self-Assembly of a Silicon-Containing Rod–Coil Liquid Crystalline Block Copolymer

Macromolecules ◽

10.1021/acs.macromol.8b01938 ◽

2019 ◽

Vol 52 (2) ◽

pp. 679-689 ◽

Cited By ~ 13

Author(s):

Ling-Ying Shi ◽

Sangho Lee ◽

Li-Chen Cheng ◽

Hejin Huang ◽

Fen Liao ◽

...

Keyword(s):

Thin Film ◽

Block Copolymer ◽

Self Assembly ◽

Liquid Crystalline

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Self-assembly of maltoheptaose-b-PMMA block copolymer systems: 10 nm Resolution in thin film and bulk states

Carbohydrate Polymers ◽

10.1016/j.carbpol.2017.04.029 ◽

2017 ◽

Vol 170 ◽

pp. 15-22 ◽

Cited By ~ 1

Author(s):

C.M. Noronha ◽

I. Otsuka ◽

C. Bouilhac ◽

C. Rochas ◽

P.L.M. Barreto ◽

...

Keyword(s):

Thin Film ◽

Block Copolymer ◽

Self Assembly

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Solvent annealing assisted self-assembly of hydrogen-bonded interpolymer complexes of AB block copolymer/C homopolymer in thin film

Polymer ◽

10.1016/j.polymer.2010.08.047 ◽

2010 ◽

Vol 51 (21) ◽

pp. 4836-4842 ◽

Cited By ~ 12

Author(s):

Chao Wang ◽

Tingmei Wang ◽

Qihua Wang

Keyword(s):

Thin Film ◽

Block Copolymer ◽

Self Assembly ◽

Interpolymer Complexes ◽

Solvent Annealing ◽

Ab Block Copolymer ◽

Hydrogen Bonded

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Hierarchical Self-Assembly of Thickness-Modulated Block Copolymer Thin Films for Controlling Nanodomain Orientations inside Bare Silicon Trenches

Polymers ◽

10.3390/polym13040553 ◽

2021 ◽

Vol 13 (4) ◽

pp. 553

Author(s):

Jin Yong Shin ◽

Young Taek Oh ◽

Simon Kim ◽

Hoe Yeon Lim ◽

Bom Lee ◽

...

Keyword(s):

Thin Film ◽

Block Copolymer ◽

Self Assembly ◽

Low Cost ◽

Polymer Brush ◽

Self Assembled Monolayer ◽

Precise Control ◽

Energy Devices ◽

Manufacturing Techniques ◽

Chemical Pretreatments

We study the orientation and ordering of nanodomains of a thickness-modulated lamellar block copolymer (BCP) thin film at each thickness region inside a topological nano/micropattern of bare silicon wafers without chemical pretreatments. With precise control of the thickness gradient of a BCP thin film and the width of a bare silicon trench, we successfully demonstrate (i) perfectly oriented lamellar nanodomains, (ii) pseudocylindrical nanopatterns as periodically aligned defects from the lamellar BCP thin film, and (iii) half-cylindrical nanostructure arrays leveraged by a trench sidewall with the strong preferential wetting of the PMMA block of the BCP. Our strategy is simple, efficient, and has an advantage in fabricating diverse nanopatterns simultaneously compared to conventional BCP lithography utilizing chemical pretreatments, such as a polymer brush or a self-assembled monolayer (SAM). The proposed self-assembly nanopatterning process can be used in energy devices and biodevices requiring various nanopatterns on the same device and as next-generation nanofabrication processes with minimized fabrication steps for low-cost manufacturing techniques.

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