scholarly journals Wet Brush Homopolymers as “Smart Solvents” for Rapid, Large Period Block Copolymer Thin Film Self-Assembly

2020 ◽  
Vol 53 (3) ◽  
pp. 1098-1113 ◽  
Author(s):  
Gregory S. Doerk ◽  
Ruipeng Li ◽  
Masafumi Fukuto ◽  
Kevin G. Yager
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Large Period

Directed Block Copolymer Thin Film Self-Assembly: Emerging Trends in Nanopattern Fabrication

2013 ◽  
Vol 46 (19) ◽  
pp. 7567-7579 ◽  
Author(s):  
Ming Luo ◽  
Thomas H. Epps
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Emerging Trends

scholarly journals Non‐Native Block Copolymer Thin Film Nanostructures Derived from Iterative Self‐Assembly Processes

2019 ◽  
Vol 7 (5) ◽  
pp. 1901747
Author(s):  
Nils Demazy ◽  
Cian Cummins ◽  
Karim Aissou ◽  
Guillaume Fleury
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Thin Film Nanostructures

Controlled co-solvent vapor annealing and the importance of quenching conditions in thin-film block copolymer self-assembly

2017 ◽  
Vol 55 (15) ◽  
pp. 1125-1130 ◽  
Author(s):  
Brian C. Stahl ◽  
Edward J. Kramer ◽  
Craig J. Hawker ◽  
Nathaniel A. Lynd
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Solvent Vapor ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing

Chemically directed self-assembly of perpendicularly aligned cylinders by a liquid crystalline block copolymer

2015 ◽  
Vol 3 (12) ◽  
pp. 2837-2847 ◽  
Author(s):  
N. Yamashita ◽  
S. Watanabe ◽  
K. Nagai ◽  
M. Komura ◽  
T. Iyoda ◽  
...  
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Liquid Crystalline ◽  
Microphase Separation ◽  
Thermally Induced ◽  
Multiplication Process

Chemical epitaxy with a density multiplication process was applied to the perpendicularly oriented hexagonal cylinder nanostructure of liquid crystalline block copolymer (PEO-b-PMA(Az)) thin film through thermally induced microphase separation by using a newly designed PMA(Az)24 brush.

Self-assembly morphology effects on the crystallization of semicrystalline block copolymer thin film

2007 ◽  
Vol 126 (10) ◽  
pp. 104902 ◽  
Author(s):  
Yuhan Wei ◽  
Caiyuan Pan ◽  
Binyao Li ◽  
Yanchun Han
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly

scholarly journals Thin Film Self-Assembly of a Silicon-Containing Rod–Coil Liquid Crystalline Block Copolymer

2019 ◽  
Vol 52 (2) ◽  
pp. 679-689 ◽  
Author(s):  
Ling-Ying Shi ◽  
Sangho Lee ◽  
Li-Chen Cheng ◽  
Hejin Huang ◽  
Fen Liao ◽  
...  
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Liquid Crystalline

scholarly journals Self-assembly of maltoheptaose-b-PMMA block copolymer systems: 10 nm Resolution in thin film and bulk states

2017 ◽  
Vol 170 ◽  
pp. 15-22 ◽  
Author(s):  
C.M. Noronha ◽  
I. Otsuka ◽  
C. Bouilhac ◽  
C. Rochas ◽  
P.L.M. Barreto ◽  
...  
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly

scholarly journals Hierarchical Self-Assembly of Thickness-Modulated Block Copolymer Thin Films for Controlling Nanodomain Orientations inside Bare Silicon Trenches

Polymers ◽  
2021 ◽  
Vol 13 (4) ◽  
pp. 553
Author(s):  
Jin Yong Shin ◽  
Young Taek Oh ◽  
Simon Kim ◽  
Hoe Yeon Lim ◽  
Bom Lee ◽  
...  
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Low Cost ◽  
Polymer Brush ◽  
Self Assembled Monolayer ◽  
Precise Control ◽  
Energy Devices ◽  
Manufacturing Techniques ◽  
Chemical Pretreatments

We study the orientation and ordering of nanodomains of a thickness-modulated lamellar block copolymer (BCP) thin film at each thickness region inside a topological nano/micropattern of bare silicon wafers without chemical pretreatments. With precise control of the thickness gradient of a BCP thin film and the width of a bare silicon trench, we successfully demonstrate (i) perfectly oriented lamellar nanodomains, (ii) pseudocylindrical nanopatterns as periodically aligned defects from the lamellar BCP thin film, and (iii) half-cylindrical nanostructure arrays leveraged by a trench sidewall with the strong preferential wetting of the PMMA block of the BCP. Our strategy is simple, efficient, and has an advantage in fabricating diverse nanopatterns simultaneously compared to conventional BCP lithography utilizing chemical pretreatments, such as a polymer brush or a self-assembled monolayer (SAM). The proposed self-assembly nanopatterning process can be used in energy devices and biodevices requiring various nanopatterns on the same device and as next-generation nanofabrication processes with minimized fabrication steps for low-cost manufacturing techniques.

Site-Selective Self-Assembly of Fullerene Nanoparticles on Amphiphilic Block Copolymer Thin Film from Water Suspension

2012 ◽  
Vol 51 ◽  
pp. 070201 ◽  
Author(s):  
Tianyu Yang ◽  
Shuai Zhang ◽  
Motonori Komura ◽  
Tomokazu Iyoda ◽  
Keiji Nagai
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Amphiphilic Block Copolymer ◽  
Water Suspension ◽  
Fullerene Nanoparticles ◽  
Site Selective
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