Process control for low temperature reactive deposition of Al doped ZnO films by ICP-assisted DC magnetron sputtering

2005 ◽  
Vol 200 (1-4) ◽  
pp. 862-866 ◽  
Author(s):  
S.J. Jung ◽  
B.M. Koo ◽  
Y.H. Han ◽  
J.J. Lee ◽  
J.H. Joo
Keyword(s):  
Low Temperature ◽  
Process Control ◽  
Magnetron Sputtering ◽  
Zno Films ◽  
Dc Magnetron Sputtering ◽  
Reactive Deposition ◽  
Doped Zno

Effect of Sputtering Pressure on Al-doped ZnO Films by DC Magnetron Sputtering

2013 ◽  
Vol 27 (10) ◽  
pp. 1112-1116 ◽  
Author(s):  
Ke-Wei SUN ◽  
Wan-Cheng ZHOU ◽  
Shan-Shan HUANG ◽  
Xiu-Feng TANG
Keyword(s):  
Magnetron Sputtering ◽  
Zno Films ◽  
Dc Magnetron Sputtering ◽  
Doped Zno ◽  
Sputtering Pressure

Characteristic of Ga-Doped ZnO Films Deposited by DC Magnetron Sputtering with a Sintered Ceramic ZnO:Ga Target

2008 ◽  
Vol 53 (1) ◽  
pp. 416-420 ◽  
Author(s):  
Jung-Chul Lee ◽  
Yang-Do Kim ◽  
Pung-Keun Song ◽  
Jin-Ho Lee ◽  
Young-Seok Kim ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Zno Films ◽  
Dc Magnetron Sputtering ◽  
Sintered Ceramic ◽  
Doped Zno
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