Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process

Transparent electrodes are a core component for transparent electron devices, photoelectric devices, and advanced displays. In this work, we fabricate fully-transparent, highly-conductive Al-doped ZnO (AZO) films using an atomic layer deposition (ALD) system method of repeatedly stacking ZnO and Al2O3 layers. The influences of Al cycle ratio (0, 2, 3, and 4%) on optical property, conductivity, crystallinity, surface morphology, and material components of the AZO films are examined, and current conduction mechanisms of the AZO films are analyzed. We found that Al doping increases electron concentration and optical bandgap width, allowing the AZO films to excellently combine low resistivity with high transmittance. Besides, Al doping induces preferred-growth-orientation transition from (002) to (100), which improves surface property and enhances current conduction across the AZO films. Interestingly, the AZO films with an Al cycle ratio of 3% show preferable film properties. Transparent ZnO thin film transistors (TFTs) with AZO electrodes are fabricated, and the ZnO TFTs exhibit superior transparency and high performance. This work accelerates the practical application of the ALD process in fabricating transparent electrodes.

High-performance silver nanowires transparent conductive electrodes fabricated using manufacturing-ready high-speed photonic sinterization solutions

On the long road towards low-cost flexible hybrid electronics, integration and printable solar energy harvesting solutions, there is an urgent need for high-performance transparent conductive electrodes produced using manufacturing-ready techniques and equipment. In recent years, randomly-distributed metallic nanowire-based transparent mesh electrodes have proven highly-promising as they offer a superb compromise between high performances and low fabrication costs. Unfortunately, these high figure-of-merit transparent mesh electrodes usually rely heavily on extensive post-deposition processing. While conventional thermal annealing yields good performances, it is especially ill-suited for deposition on low-temperature substrates or for high-throughput manufacturing solutions. Similarly, laser-induced annealing severely limits the processing time for electrodes covering large surfaces. In this paper, we report the fabrication of ultra high-performance silver nanowires-based transparent conductive electrodes fabricated using optimized manufacturing-ready ultrafast photonic curing solutions. Using conventional indium tin oxide (ITO) as our benchmark for transparent electrodes, we demonstrate a 2.6–2.7 $$\times $$ × performance gain using two different figure-of-merit indicators. Based on these results, we believe this research provides an ideal manufacturing-ready approach for the large-scale and low-cost fabrication of ultra high-performance transparent electrodes for flexible hybrid electronics and solar-energy harvesting applications.