High Deposition Rate Symmetric Magnet Pack for High Power Pulsed Magnetron Sputtering

2016 ◽  
Vol 293 ◽  
pp. 10-15 ◽  
Author(s):  
Priya Raman ◽  
Ivan Shchelkanov ◽  
Jake McLain ◽  
Matthew Cheng ◽  
David Ruzic ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Rate ◽  
High Power ◽  
High Deposition Rate ◽  
Pulsed Magnetron

A high power impulse magnetron sputtering model to explain high deposition rate magnetic field configurations

2016 ◽  
Vol 120 (16) ◽  
pp. 163301 ◽  
Author(s):  
Priya Raman ◽  
Justin Weberski ◽  
Matthew Cheng ◽  
Ivan Shchelkanov ◽  
David N. Ruzic
Keyword(s):  
Magnetic Field ◽  
Magnetron Sputtering ◽  
Deposition Rate ◽  
High Power ◽  
High Deposition Rate

The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering

Vacuum ◽  
2008 ◽  
Vol 82 (8) ◽  
pp. 867-870 ◽  
Author(s):  
Jens Emmerlich ◽  
Stanislav Mráz ◽  
Rony Snyders ◽  
Kaiyun Jiang ◽  
Jochen M. Schneider
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Rate ◽  
High Power ◽  
Physical Reason ◽  
Pulsed Magnetron

scholarly journals On the deposition rate in a high power pulsed magnetron sputtering discharge

2006 ◽  
Vol 89 (15) ◽  
pp. 154104 ◽  
Author(s):  
J. Alami ◽  
K. Sarakinos ◽  
G. Mark ◽  
M. Wuttig
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Rate ◽  
High Power ◽  
Pulsed Magnetron

p-type semi-transparent conductive NiO films with high deposition rate produced by superimposed high power impulse magnetron sputtering

2020 ◽  
Vol 46 (17) ◽  
pp. 27695-27701 ◽  
Author(s):  
Tung-Han Chuang ◽  
Chao-Kuang Wen ◽  
Sheng-Chi Chen ◽  
Ming-Han Liao ◽  
Fen Liu ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Rate ◽  
High Power ◽  
High Deposition Rate ◽  
P Type ◽  
Nio Films

High power pulsed magnetron sputtering: A method to increase deposition rate

2015 ◽  
Vol 33 (3) ◽  
pp. 031304 ◽  
Author(s):  
Priya Raman ◽  
Ivan A. Shchelkanov ◽  
Jake McLain ◽  
David N Ruzic
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Rate ◽  
High Power ◽  
Pulsed Magnetron

Pulse synchronized substrate bias for the High Power Pulsed Magnetron Sputtering deposition of CrAlN

2021 ◽  
pp. 138792
Author(s):  
K. Bobzin ◽  
T. Brögelmann ◽  
N.C. Kruppe ◽  
M. Engels ◽  
C. Schulze
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Substrate Bias ◽  
Sputtering Deposition ◽  
Pulsed Magnetron
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