A high power impulse magnetron sputtering model to explain high deposition rate magnetic field configurations

2016 ◽  
Vol 120 (16) ◽  
pp. 163301 ◽  
Author(s):  
Priya Raman ◽  
Justin Weberski ◽  
Matthew Cheng ◽  
Ivan Shchelkanov ◽  
David N. Ruzic
Keyword(s):  
Magnetic Field ◽  
Magnetron Sputtering ◽  
Deposition Rate ◽  
High Power ◽  
High Deposition Rate

High Deposition Rate Symmetric Magnet Pack for High Power Pulsed Magnetron Sputtering

2016 ◽  
Vol 293 ◽  
pp. 10-15 ◽  
Author(s):  
Priya Raman ◽  
Ivan Shchelkanov ◽  
Jake McLain ◽  
Matthew Cheng ◽  
David Ruzic ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Rate ◽  
High Power ◽  
High Deposition Rate ◽  
Pulsed Magnetron

p-type semi-transparent conductive NiO films with high deposition rate produced by superimposed high power impulse magnetron sputtering

2020 ◽  
Vol 46 (17) ◽  
pp. 27695-27701 ◽  
Author(s):  
Tung-Han Chuang ◽  
Chao-Kuang Wen ◽  
Sheng-Chi Chen ◽  
Ming-Han Liao ◽  
Fen Liu ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Rate ◽  
High Power ◽  
High Deposition Rate ◽  
P Type ◽  
Nio Films

Technological Features of the Thick Tin Film Deposition by with Magnetron Sputtering Form Liquid-Phase Target

2018 ◽  
Vol 781 ◽  
pp. 8-13 ◽  
Author(s):  
Mariya Makarova ◽  
Konstantin Moiseev ◽  
Alexander Nazarenko ◽  
Petr Luchnikov ◽  
Galina Dalskaya ◽  
...  
Keyword(s):  
Liquid Phase ◽  
Magnetron Sputtering ◽  
Deposition Rate ◽  
Amorphous Structure ◽  
Film Deposition ◽  
High Deposition Rate ◽  
Crucible Material ◽  
Tin Films ◽  
X Ray ◽  
Tin Film

Technological features of obtaining of tin films in a vacuum by liquid-phase target magnetron sputtering were reviewed. With high deposition rate the white color tin coating with amorphous structure is formed on the substrate. X-ray microanalysis of the obtained tin films showed the presence of micro-and nanoparticles of an impurity of the crucible material in the structure of the films. The use of the tantalum crucible with liquid-phase target magnetron sputtering with deposition rate of 3.2 μm / min allows obtaining ultra-pure, continuous, homogeneous tin film on a stationary substrate without impurity material of the crucible.

Magnetic field influence on ionization zones in high-power impulse Magnetron Sputtering

Vacuum ◽  
2018 ◽  
Vol 156 ◽  
pp. 9-19 ◽  
Author(s):  
Priya Raman ◽  
Matthew Cheng ◽  
Justin Weberski ◽  
Wenyu Xu ◽  
Thomas Houlahan ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Magnetron Sputtering ◽  
High Power ◽  
Field Influence

Preparation and Properties of a-Si Films Deposited at a High Deposition Rate under a Magnetic Field

1988 ◽  
Vol 27 (Part 1, No. 1) ◽  
pp. 40-46 ◽  
Author(s):  
Michitoshi Ohnishi ◽  
Hidenori Nishiwaki ◽  
Kenji Uchihashi ◽  
Kazuhiro Yoshida ◽  
Makoto Tanaka ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Deposition Rate ◽  
High Deposition Rate ◽  
Si Films

scholarly journals Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields

2012 ◽  
Vol 21 (2) ◽  
pp. 025005 ◽  
Author(s):  
N Brenning ◽  
C Huo ◽  
D Lundin ◽  
M A Raadu ◽  
C Vitelaru ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Electric Fields ◽  
Deposition Rate ◽  
High Power ◽  
Rate Loss
Sign in / Sign up

Export Citation Format

Share Document