High oxidation activity of thallium oxide for carbon combustion

Peroxisome induction can be expressed as an increase in peroxisome area (proliferation) or as an increase in peroxisomal fatty acid oxidation (activity). This study compares proliferation and activity as endpoints for hepatic peroxisome induction by perfluorodecanoic acid (PFDA). Fluorocarboxylic acids such as PFDA represent a class of compounds possessing commercially important surfactant properties. A single 50 mg/Kg ip. dose of PFDA produces a characteristic “wasting syndrome” in male F-344 rats. Symptoms include hypophagia, weight loss, hepatomegaly, and delayed lethality. Hepatic studies reveal changes similar to those seen with the hypolipidemic agent clofibrate. These include mitochondrial disruption, endoplasmic reticulum and peroxisome proliferation, and increased peroxisomal acyl-CoA oxidase activity.Male Fisher-344 rats received a single ip. dose of 2, 20, or 50mg/Kg PFDA dissolved in 1:1 propylene glycol/water and were sacrificed 8 days post-dose. All control rats received an equal volume of vehicle ip. Animals were provided food and water ad libitum, except pair-fed controls which received the same restrictive food intake consumed by their weight-paired dosed partners (50mg/Kg PFDA group) to simulate the hypophagia associated with PFDA.

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The Structure and Properties of MoSi2 Thin Film in Mos Process

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s1431927600001379 ◽

1980 ◽

Vol 38 ◽

pp. 326-327

Author(s):

C.K. Wu ◽

P. Chang ◽

N. Godinho

Keyword(s):

Thin Film ◽

Integrated Circuits ◽

High Performance ◽

Large Scale ◽

Process Development ◽

Structure And Properties ◽

Metal Silicides ◽

High Oxidation ◽

Important Approach ◽

High Oxidation Resistance

Recently, the use of refractory metal silicides as low resistivity, high temperature and high oxidation resistance gate materials in large scale integrated circuits (LSI) has become an important approach in advanced MOS process development (1). This research is a systematic study on the structure and properties of molybdenum silicide thin film and its applicability to high performance LSI fabrication.

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Chemical and crystallographic factors in carbon combustion

Journal de Chimie Physique ◽

10.1051/jcp/1950470565 ◽

1950 ◽

Vol 47 ◽

pp. 565-572 ◽

Cited By ~ 11

Author(s):

H. L. Riley

Keyword(s):

Carbon Combustion

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ALTEMP V36

Alloy Digest ◽

10.31399/asm.ad.co0025 ◽

1961 ◽

Vol 10 (2) ◽

Keyword(s):

Corrosion Resistance ◽

High Temperature ◽

Precipitation Hardening ◽

Base Alloy ◽

Heat Treating ◽

High Oxidation ◽

Cobalt Base Alloy ◽

Cobalt Base ◽

Oxidation And Corrosion ◽

Hardening Heat Treatment

Abstract Altemp V36 is a cobalt-base alloy recommended for high temperature applications. It has high oxidation and corrosion resistance. It shows a slight response to a precipitation-hardening heat treatment. This datasheet provides information on composition, physical properties, hardness, elasticity, and tensile properties as well as creep, deformation, and fatigue. It also includes information on high temperature performance and corrosion resistance as well as forming, heat treating, machining, and joining. Filing Code: Co-25. Producer or source: Allegheny Ludlum Corporation.

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COLMONOY No. 21

Alloy Digest ◽

10.31399/asm.ad.ni0504 ◽

1996 ◽

Vol 45 (3) ◽

Keyword(s):

Cast Iron ◽

Physical Properties ◽

Oxidation Resistance ◽

Base Alloy ◽

Nickel Base Alloy ◽

Powder Metal ◽

High Oxidation ◽

High Oxidation Resistance ◽

Nickel Base

Abstract Colmonoy No. 21 is a nickel-base alloy for repairing cast iron parts. The deposit has high oxidation resistance, develops a hardness of Rockwell C 26-31, and is easily finished by filing or grinding. This datasheet provides information on composition, physical properties, and hardness. It also includes information on machining, joining, and powder metal forms. Filing Code: Ni-504. Producer or source: Wall Colmonoy Corporation.

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