Investigations on the effects of plasma-assisted pre-treatment for plasma-assisted chemical vapour deposition TiN coatings on tool steel

2004 ◽  
Vol 461 (2) ◽  
pp. 277-281 ◽  
Author(s):  
K Gammer ◽  
M Stoiber ◽  
J Wagner ◽  
H Hutter ◽  
R Kullmer ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Tool Steel ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Tin Coatings ◽  
Pre Treatment

Process Control of Laser Chemical Vapour Deposition of TiC on Tool Steel

1996 ◽  
pp. 703-710
Author(s):  
A. Hatziapostolou ◽  
I. Zergioti ◽  
E. Hontzopoulos ◽  
A. Zervaki ◽  
G. Haidemenopoulos
Keyword(s):  
Process Control ◽  
Chemical Vapour Deposition ◽  
Tool Steel ◽  
Vapour Deposition ◽  
Chemical Vapour

Anticorrosion behaviour of amorphous silicon-based coatings prepared by remote cold plasma-assisted chemical vapour deposition process

2018 ◽  
pp. 23-31
Author(s):  
A. Delimi
Keyword(s):  
Corrosion Resistance ◽  
Carbon Steel ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Electrochemical Impedance ◽  
Electrochemical Behaviour ◽  
Chemical Vapour ◽  
Steel Specimen ◽  
Nitrogen Plasma ◽  
Pre Treatment

Organosilicon films were deposited on carbon steel samples using remote microwave nitrogen plasma-assisted chemical vapour deposition. The deposits were obtained using TetraMethyDisoloxane monomer mixed with oxygen. The formed films were characterised using electron microprobe analysis, Fourier transformed infrared spectroscopy, contact angle measurements, scanning electron microscopy and atomic force microscopy. The electrochemical properties of the organosilicon coatings were evaluated using gravimetric experiments next to electrochemical tests. A significant increase in the corrosion resistance behaviour of the organosilicon coated carbon steel specimen was found when the samples were immersed in 3% aqueous sodium chloride solutions. Also, the surface pre-treatment process of carbon steel had an important influence on the morphological and electrochemical behaviour. Argon pre-treatment improves significantly the corrosion resistance or organosilicon coated steel samples. Gravimetric tests in particular showed that samples pre-treated with argon result in lower weight loss and decreased corrosion rates compared to interfaces pre-treated with nitrogen plasma. Keywords: PACVD, carbon steel, organ silicon, corrosion, pre-treatment, electrochemical impedance spectroscopy.

Microstructural Characterization of 3C-SiC Layers, Grown Epitaxially on 4H-SiC Substrates by CVD

2015 ◽  
Vol 1096 ◽  
pp. 22-26
Author(s):  
Efstathios K. Polychroniadis ◽  
Mamour Sall ◽  
N. Chandran
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Microstructural Characterization ◽  
Twin Boundaries ◽  
Pre Treatment

This work was performed on 3C-SiC layers grown on 4H-SiC substrates by chemical vapour deposition after a surface pre-treatment using GeH4 gas. By means of TEM, the effects of different GeH4 fluxes in the 3C layer quality has been studied and compared. An optimal GeH4 flux permits to drastically reduce twin boundaries but another type of defect occurs and has been widely studied in this paper.

TiC and TiN coatings formed on Si3N4TiC composite ceramics by chemical vapour deposition

1988 ◽  
Vol 165 (1) ◽  
pp. 149-161 ◽  
Author(s):  
D.W. Kim ◽  
Y.J. Park ◽  
J.G. Lee ◽  
John S. Chun
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Composite Ceramics ◽  
Tin Coatings

Low-pressure chemical vapour deposition of mullite coatings in a cold-wall reactor

1999 ◽  
Vol 09 (PR8) ◽  
pp. Pr8-395-Pr8-402 ◽  
Author(s):  
B. Armas ◽  
M. de Icaza Herrera ◽  
C. Combescure ◽  
F. Sibieude ◽  
D. Thenegal
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Cold Wall ◽  
Pressure Chemical ◽  
Mullite Coatings

Thermodynamical and experimental conditions of hafnium carbide chemical vapour deposition

1999 ◽  
Vol 09 (PR8) ◽  
pp. Pr8-373-Pr8-380 ◽  
Author(s):  
P. Sourdiaucourt ◽  
A. Derré ◽  
P. Delhaès ◽  
P. David
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hafnium Carbide ◽  
Experimental Conditions
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