Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering

2006 ◽  
Vol 494 (1-2) ◽  
pp. 146-150 ◽  
Author(s):  
M. Benegra ◽  
D.G. Lamas ◽  
M.E. Fernández de Rapp ◽  
N. Mingolo ◽  
A.O. Kunrath ◽  
...  
Keyword(s):  
Thin Films ◽  
Residual Stresses ◽  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Direct Current ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Pulsed Direct Current

Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering

2006 ◽  
Vol 200 (8) ◽  
pp. 2764-2768 ◽  
Author(s):  
S. Mahieu ◽  
P. Ghekiere ◽  
G. De Winter ◽  
R. De Gryse ◽  
D. Depla ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron

Hydrogen-free carbon thin films prepared by unbalanced magnetron sputtering

2006 ◽  
Author(s):  
Junqi Xu ◽  
Lingxia Hang ◽  
Weiguo Liu ◽  
Huiqing Fan ◽  
Yingxue Xing
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Free Carbon ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Carbon Thin Films
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