A kinetic analysis of residual stress evolution in polycrystalline thin films

2012 ◽  
Vol 526 ◽  
pp. 1-14 ◽  
Author(s):  
Eric Chason
2018 ◽  
Vol 133 (3) ◽  
pp. 578-581
Author(s):  
Z.P. Mudau ◽  
C.J. Sheppard ◽  
A.R.E. Prinsloo ◽  
A.M. Venter ◽  
T.P. Ntsoane ◽  
...  

2021 ◽  
pp. 162799
Author(s):  
J. Chakraborty ◽  
T. Oellers ◽  
R. Raghavan ◽  
A. Ludwig ◽  
G. Dehm

1998 ◽  
Vol 287-288 ◽  
pp. 275-282 ◽  
Author(s):  
M. Ye ◽  
G. Berton ◽  
J-.L. Delplancke ◽  
M.-P. Delplancke ◽  
Luc Segers ◽  
...  

2003 ◽  
Vol 779 ◽  
Author(s):  
Lucia Nicola ◽  
Erik Van der Giessen ◽  
Alan Needleman

AbstractThermal stress evolution in polycrystalline thin films is analyzed using discrete dislocation plasticity. Stress develops in the film during cooling from a stress-free configuration due to the difference in thermal expansion coefficient between the film and its substrate. A plane strain formulation with only edge dislocations is used and each grain of the polycrystal has a specified set of slip systems. The film–substrate interface and the grain boundaries are impenetrable for the dislocations. Results are presented for two film thicknesses, with higher hardening seen for the thinner films.


2002 ◽  
Vol 88 (15) ◽  
Author(s):  
E. Chason ◽  
B. W. Sheldon ◽  
L. B. Freund ◽  
J. A. Floro ◽  
S. J. Hearne

2007 ◽  
Vol 98 (21) ◽  
Author(s):  
Juan S. Tello ◽  
Allan F. Bower ◽  
Eric Chason ◽  
Brian W. Sheldon

Sign in / Sign up

Export Citation Format

Share Document