scholarly journals Reduction of surface recombination velocity by rapid thermal annealing of p-Si passivated by catalytic-chemical vapor deposited alumina films

2015 ◽  
Vol 575 ◽  
pp. 56-59 ◽  
Author(s):  
Yoh-Ichiro Ogita ◽  
Masayuki Tachihara
2012 ◽  
Vol 522 ◽  
pp. 336-339 ◽  
Author(s):  
Pierre Saint-Cast ◽  
Armin Richter ◽  
Etienne Billot ◽  
Marc Hofmann ◽  
Jan Benick ◽  
...  

1991 ◽  
Vol 70 (4) ◽  
pp. 2366-2369 ◽  
Author(s):  
Jong‐Sung Hong ◽  
Yong Tae Kim ◽  
Suk‐Ki Min ◽  
Tae Won Kang ◽  
Chi Yhou Hong

2006 ◽  
Vol 910 ◽  
Author(s):  
Mahdi Farrokh Baroughi ◽  
Siva Sivoththaman

AbstractThis paper presents a measurement technique for studying of the interface between a nanocrystalline silicon (nc-Si) film and a crystalline silicon (c-Si) substrate using microwave photoconductivity decay (MWPCD). The nc-Si films were deposited using plasma enhanced chemical vapor deposition of highly hydrogen-diluted silane. The films were deposited on both sides of the high purity float-zone (FZ) Si wafers. The high resolution transmission electron microscope (HRTEM) analysis of the interface and the characterization of the effective excess carrier lifetime of the samples using MWPCD revealed the following results: (i) The crystallinity of the deposited nc-Si films is very high. The nc-Si film follows the crystal orientation of the substrate such that not a well-defined boundary between nc-Si film and the c-Si substrate is observed. (ii) A surface recombination velocity of less than 10 cm/s was measured for the interface region of the nc-Si/c-Si junctions. (iii) A small discontinuity in the band-energy diagram of the interface region was observed.


1997 ◽  
Vol 08 (04) ◽  
pp. 703-717 ◽  
Author(s):  
Y. K. Su ◽  
C. T. Lin

The principal aim of this paper is to propose an easy, vapor phase, and reproducible photo surface treatment method to improve the device performance of the Hg0.8Cd0.2Te photoconductive detector. Experimental results, including Auger electron spectroscopy (AES), MIS leakage current, 1/f noise voltage spectrum, 1/fknee frequency, responsivity Rλ, and specific detectivity D* for stacked photo surface treatment and ZnS or CdTe passivation layers are presented. By using this method, we found that there is no accumulation of Hg in the oxide/HgCdTe interface regions. Since the photo chemical vapor native oxidation is a dry oxidation method deposited at a low temperature, it can effectively suppress the Hg enhancement and the Cd depletion effects and thus obtain a high quality interface. We also found that the photo surface treatment in combination with thermally eveporated ZnS or CdTe layer would shift the 1/fknee under 100Hz in an electrical field under 50 V/cm, reduce the noise power spectrum, and achieve a lower surface recombination velocity S of 300 cm/sec as well as a high D* of 3 × 1010 cm [Formula: see text] for blackbody radiation. It was also found that HgCdTe photoconductor passivated with stacked layers shows improved interface properties when compared to the photoconductor passivated with a single passivation layer.


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