scholarly journals Surface recombination velocity of phosphorus-diffused silicon solar cell emitters passivated with plasma enhanced chemical vapor deposited silicon nitride and thermal silicon oxide

2001 ◽  
Vol 89 (7) ◽  
pp. 3821-3826 ◽  
Author(s):  
M. J. Kerr ◽  
J. Schmidt ◽  
A. Cuevas ◽  
J. H. Bultman
2018 ◽  
Vol 09 (02) ◽  
pp. 189-201
Author(s):  
Ousmane Diasse ◽  
Amadou Diao ◽  
Mamadou Wade ◽  
Marcel Sitor Diouf ◽  
Ibrahima Diatta ◽  
...  

2015 ◽  
Author(s):  
Ashish Sharma ◽  
Sandra Zivanovic ◽  
Shravan R. Animilli ◽  
Dentcho A. Genov

There is an important need for improvement in both cost and efficiency of photovoltaic cells. For improved efficiency a better understanding of solar cell performance is required. In this paper we propose an analytical kinetic model of thin-film silicon solar cell, which can provide an intuitive understanding of the effect of illumination on its charge carriers and electric current. The separate cases of homogeneous and inhomogeneous charge carrier generation rates across the device are investigated. Our model also provides for the study of the carrier transport within the quasi-neutral and depletion zones of the device, which is of importance for thin-film solar cells. Two boundary conditions based on (i) fixed surface recombination velocity at the electrodes and (ii) intrinsic conditions for large size devices are explored. The device short circuit current and open circuit voltage are found to increase with the decrease of surface recombination velocity at electrodes. The power conversion efficiency of thin film solar cells is observed to strongly depend on impurity doping concentrations. The developed analytical kinetic model can be used to optimize the design and performance of thin-film solar cells without involving highly complicating numerical codes to solve the corresponding drift-diffusion equations.


2012 ◽  
Vol 522 ◽  
pp. 336-339 ◽  
Author(s):  
Pierre Saint-Cast ◽  
Armin Richter ◽  
Etienne Billot ◽  
Marc Hofmann ◽  
Jan Benick ◽  
...  

2012 ◽  
Vol 2012 ◽  
pp. 1-5 ◽  
Author(s):  
Youngseok Lee ◽  
Woongkyo Oh ◽  
Vinh Ai Dao ◽  
Shahzada Qamar Hussain ◽  
Junsin Yi

It is difficult to deposit extremely thin a-Si:H layer in heterojunction with intrinsic thin layer (HIT) solar cell due to thermal damage and tough process control. This study aims to understand oxide passivation mechanism of silicon surface using rapid thermal oxidation (RTO) process by examining surface effective lifetime and surface recombination velocity. The presence of thin insulating a-Si:H layer is the key to get highVocby lowering the leakage current (I0) which improves the efficiency of HIT solar cell. The ultrathin thermal passivation silicon oxide (SiO2) layer was deposited by RTO system in the temperature range 500–950°C for 2 to 6 minutes. The thickness of the silicon oxide layer was affected by RTO annealing temperature and treatment time. The best value of surface recombination velocity was recorded for the sample treated at a temperature of 850°C for 6 minutes at O2flow rate of 3 Lpm. A surface recombination velocity below 25 cm/s was obtained for the silicon oxide layer of 4 nm thickness. This ultrathin SiO2layer was employed for the fabrication of HIT solar cell structure instead of a-Si:H, (i) layer and the passivation and tunneling effects of the silicon oxide layer were exploited. The photocurrent was decreased with the increase of illumination intensity and SiO2thickness.


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