Influence of oxygen gas pressure on phase, microstructure and electrical properties of sodium bismuth titanate thin films grown using pulsed laser deposition

2015 ◽  
Vol 579 ◽  
pp. 44-49 ◽  
Author(s):  
A.S. Daryapurkar ◽  
J.T. Kolte ◽  
P. Gopalan
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Pulsed Laser Deposition ◽  
Bismuth Titanate ◽  
Pulsed Laser ◽  
Gas Pressure ◽  
Laser Deposition ◽  
Sodium Bismuth Titanate ◽  
Oxygen Gas

Ultraviolet Luminescence Emitted From ZnO Nanostructural Films by KrF Pulsed Laser Deposition

2002 ◽  
Vol 728 ◽  
Author(s):  
Kenji Ebihara ◽  
Tamiko Ohshima ◽  
Tomoaki Ikegami ◽  
Raj K. Thareja
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Gas Pressure ◽  
Laser Deposition ◽  
Zno Thin Films ◽  
Process Conditions ◽  
Ambient Oxygen ◽  
Oxygen Gas

AbstractZinc Oxide (ZnO) thin films have been deposited on silicon (100), quartz glass, sapphire (0001), and glass substrates by pulsed laser deposition over a range of process conditions such as versus ambient oxygen gas pressure and substrate temperature. Photoluminescence measurements have been carried out to characterize ZnO thin films for optical device applications. We have also studied the influence of the process conditions on crystal structure and morphology of the grown films. Ultraviolet luminescence near the band gap at 3.25 eV was obtained from the optical pumped grown films. And ZnO thin films deposited on sapphire single crystal substrates exhibited strong stimulated emission around 3.12 eV with increasing pumping energy. ZnO thin films deposited at ambient oxygen gas pressure of 5 mTorr and a substrate temperature of 550 °C were predominantly c-axis oriented regardless of substrate material. The crystallite size of 22.7-49.8 nm was estimated using Scherrer's formula. AFM images of films grown on sapphire substrates display hexagonally shaped grains at various sizes.

Structural, chemical and electrical properties of CdS thin films fabricated by pulsed laser deposition using varying background gas pressure

2019 ◽  
Vol 682 ◽  
pp. 24-28 ◽  
Author(s):  
V.H. Martínez-Landeros ◽  
N. Hernandez-Como ◽  
G. Gutierrez-Heredia ◽  
M.A. Quevedo-Lopez ◽  
F.S. Aguirre-Tostado
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Gas Pressure ◽  
Laser Deposition ◽  
Cds Thin Films ◽  
Background Gas

Influence of oxygen pressure on the electrical properties of Mn-doped Bi0.5Na0.5TiO3BaTiO3 thin films by pulsed laser deposition

2019 ◽  
Vol 45 (10) ◽  
pp. 13518-13522 ◽  
Author(s):  
Shan Jiao ◽  
Yi Zhang ◽  
Zhihua Duan ◽  
Tao Wang ◽  
Yanxue Tang ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Pulsed Laser Deposition ◽  
Oxygen Pressure ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Mn Doped
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