Atomic layer deposition of tantalum oxide thin films using the precursor tert -butylimido-tris-ethylmethylamido-tantalum and water: Process characteristics and film properties
Keyword(s):
2017 ◽
Vol 29
(11)
◽
pp. 4654-4666
◽
Keyword(s):
2016 ◽
Vol 9
(1)
◽
pp. 537-547
◽
Keyword(s):
2010 ◽
Vol 87
(3)
◽
pp. 373-378
◽
Keyword(s):
Keyword(s):
Keyword(s):
2004 ◽
Vol 151
(1)
◽
pp. C52
◽
Keyword(s):
2004 ◽
Vol 230
(1-4)
◽
pp. 249-253
◽
Keyword(s):
Keyword(s):
2004 ◽
Vol 374
(1-2)
◽
pp. 124-128
◽
Keyword(s):