A low temperature study of electron transport properties of tantalum nitride thin films prepared by ion beam assisted deposition

2004 ◽  
Vol 86 (2) ◽  
Author(s):  
K LAL
1996 ◽  
Vol 03 (01) ◽  
pp. 1133-1136
Author(s):  
H. KASAHARA ◽  
T. SHIKATA ◽  
K. YAMAMOTO

We investigated electron transport in fine-particle films of Au prepared onto Si native oxide. Electron transport measurements and TEM observations were carried out for as-deposited and after thermal treatment of the films in air. We observed the anomalous resistance increases in as-deposited fine-particle films of Au and obtained α T =4.5. After 150°C thermal treatment in air, however, these anomalous resistance increases in the Au films disappeared and its topography appeared on the TEM images drastically changed into percolative structure. We found that the size of the Au fine particles causes anomalous resistance increase at low temperature.


2010 ◽  
Vol 10 (8) ◽  
pp. 5042-5050 ◽  
Author(s):  
Saioa Cobo ◽  
Gábor Molnár ◽  
Franck Carcenac ◽  
Petra Á Szilágyi ◽  
Lionel Salmon ◽  
...  

2012 ◽  
Vol 135 (1) ◽  
pp. 123-129 ◽  
Author(s):  
Liviu Leontie ◽  
Ramona Danac ◽  
Mihaela Girtan ◽  
Aurelian Carlescu ◽  
Alicia Petronela Rambu ◽  
...  

2016 ◽  
Vol 94 (15) ◽  
Author(s):  
Alfonso Sanchez-Soares ◽  
Sarah L. T. Jones ◽  
John J. Plombon ◽  
Ananth P. Kaushik ◽  
Roger E. Nagle ◽  
...  

1985 ◽  
Vol 130 (1-2) ◽  
pp. 75-86 ◽  
Author(s):  
P. Rénucci ◽  
L. Gaudart ◽  
J.P. Pétrakian ◽  
D. Roux

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