Metal-organic chemical vapour deposition of manganese gallium alloys from the novel mixed metal single-source precursors (CO)5MnGa(C2H5)2[N(CH3)3], (CO)5MnGa(C2H5)2(NC7H13) and [(CO)5Mn]2Ga[(CH2)3NMe2]

1996 ◽  
Vol 289 (1-2) ◽  
pp. 147-152 ◽  
Author(s):  
Roland A Fischer ◽  
Alexander Miehr ◽  
Thomas Metzger
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Organic Chemical ◽  
The Novel ◽  
Single Source ◽  
Single Source Precursors ◽  
Mixed Metal ◽  
Metal Organic ◽  
Gallium Alloys

Metal-Organic Chemical Vapour Deposition of II-VI Semiconductor Thin Films Using Single-Source Approach

2002 ◽  
Vol 730 ◽  
Author(s):  
Mohammad Afzaal ◽  
David Crouch ◽  
Paul O'Brien ◽  
Jin-Ho Park
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Organic Chemical ◽  
Metal Chalcogenides ◽  
Single Source ◽  
Glass Substrates ◽  
Semiconductor Thin Films ◽  
Metal Organic

AbstractThin films of CdS and CdSe have been deposited on glass substrates by low pressure metal-organic chemical vapour deposition (LP-MOCVD) using Cd[(EPiPr2)2N]2 (E = S, Se) as single-source precursors. These air-stable precursors are volatile, making them suitable for the deposition of thin films. As-deposited films were crystalline metal chalcogenides, as confirmed by X-ray powder diffraction (XRD), and their morphologies were studied by scanning electron microscopy (SEM).

Epitaxial electro-optical BaTiO3 films by single-source metal–organic chemical vapour deposition

1997 ◽  
Vol 7 (6) ◽  
pp. 933-936 ◽  
Author(s):  
Jing Zhao ◽  
Vladimir Fuflyigin ◽  
Feiling Wang ◽  
Peter E. Norris ◽  
Lionel Bouthilette ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Organic Chemical ◽  
Single Source ◽  
Metal Organic

Chemical vapour deposition of II–VI semiconductor thin films using M[(TePiPr2)2N]2(M = Cd, Hg) as single-source precursors

2006 ◽  
Vol 16 (10) ◽  
pp. 966-969 ◽  
Author(s):  
Shivram S. Garje ◽  
Jamie S. Ritch ◽  
Dana J. Eisler ◽  
Mohammad Afzaal ◽  
Paul O'Brien ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Single Source Precursors ◽  
Semiconductor Thin Films

Vapour-pressure data for adducts of dimethylzinc: sources and dopants for zinc in metal–organic chemical vapour deposition

1993 ◽  
Vol 3 (7) ◽  
pp. 739-742 ◽  
Author(s):  
Paul O'Brien ◽  
John R. Walsh ◽  
Anthony C. Jones ◽  
Simon A. Rushworth ◽  
Clive Meaton
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Organic Chemical ◽  
Pressure Data ◽  
Metal Organic
Sign in / Sign up

Export Citation Format

Share Document