Chemical vapour deposition of II–VI semiconductor thin films using M[(TePiPr2)2N]2(M = Cd, Hg) as single-source precursors
2006 ◽
Vol 16
(10)
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pp. 966-969
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2016 ◽
Vol 4
(45)
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pp. 10731-10739
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2016 ◽
Vol 4
(12)
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pp. 2312-2318
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2015 ◽
Vol 415
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pp. 93-99
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